⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3072805 | 0.62 | — | — | |
| SCHEMBL19433235 | 0.61 | NMT1 (0.36) | — | |
| SCHEMBL3938213 | 0.59 | GAA (0.32) | — | |
| SCHEMBL197638 | 0.56 | — | — | |
| SCHEMBL138054 | 0.56 | — | — | |
| SCHEMBL877968 | 0.55 | — | — | |
| SCHEMBL9675754 | 0.54 | — | — | |
| SCHEMBL3259977 | 0.54 | — | — | |
| Water SCHEMBL28044737 | 0.54 | — | — | |
| SCHEMBL28044800 | 0.54 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104693130-A | Synthesis method of 2,6-diamido-3,5-dinitropyrazine-1-oxide | INST CHEMICAL MATERIAL CHINA ACADEMY ENGINEERING PHYSICS | 2015-06-10 | — | — | CN | claimed |
| EP-0397474-B1 | Photosensitive composition | TOSHIBA KK (JP) | 1997-12-10 | — | — | EP | claimed |
| EP-0397474-A2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-11-14 | — | — | EP | claimed |
| CN-104693130-A | Synthesis method of 2,6-diamido-3,5-dinitropyrazine-1-oxide | INST CHEMICAL MATERIAL CHINA ACADEMY ENGINEERING PHYSICS | 2015-06-10 | — | — | CN | disclosed |
| CN-104693130-A | Synthesis method of 2,6-diamido-3,5-dinitropyrazine-1-oxide | INST CHEMICAL MATERIAL CHINA ACADEMY ENGINEERING PHYSICS | 2015-06-10 | — | — | CN | disclosed |
| EP-0397474-B1 | Photosensitive composition | TOSHIBA KK (JP) | 1997-12-10 | — | — | EP | disclosed |
| US-5100768-A | Photoresists for integrated circuits, polyvinyl phenol and nitrogen containing heterocycle | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-03-31 | — | — | US | disclosed |
| EP-0397474-A2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1990-11-14 | — | — | EP | disclosed |
| US-4174394-A | CONTROL OF BACTERIA AND FUNGI | THE DOW CHEMICAL COMPANY (US) | 1979-11-13 | — | — | US | disclosed |
| US-4101546-A | Cyanatothiomethylthio pyrazines | THE DOW CHEMICAL COMPANY (US) | 1978-07-18 | — | — | US | disclosed |
| US-4082844-A | ANOREXIC AGENTS | MERCK & CO., INC. (US) | 1978-04-04 | — | — | US | disclosed |
| US-4081542-A | ANOREXIC AGENTS | MERCK & CO., INC. (US) | 1978-03-28 | — | — | US | disclosed |