SCHEMBL8828020

SCHEMBL8828020

CN(C[SiH](C)C)[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8848385 0.69
SCHEMBL10712244 0.67
SCHEMBL15318976 0.62
SCHEMBL16424639 0.60
SCHEMBL16275199 0.60
SCHEMBL234006 0.57
SCHEMBL12758976 0.55
SCHEMBL8827919 0.54
Trimethylammonium SCHEMBL5887466 0.51
SCHEMBL31256476 0.48

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5698037-A Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing STAUFFER CRAIG M (US) 1997-12-16 US disclosed
EP-0587724-B1 INTEGRATED DELIVERY MODULE FOR CHEMICAL VAPOR FROM NON-GASEOUS SOURCES FOR SEMICONDUCTOR PROCESSING STAUFFER CRAIG M (US) 1996-10-23 EP disclosed
US-5505782-A Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor proccessing STAUFFER CRAIG M (US) 1996-04-09 US disclosed
EP-0587724-A4 INTEGRATED DELIVERY SYSTEM FOR CHEMICAL VAPOR FROM NON-GASEOUS SOURCES FOR SEMICONDUCTOR PROCESSING STAUFFER CRAIG M (US) 1994-06-01 EP disclosed
EP-0587724-A1 INTEGRATED DELIVERY SYSTEM FOR CHEMICAL VAPOR FROM NON-GASEOUS SOURCES FOR SEMICONDUCTOR PROCESSING. STAUFFER CRAIG M (US) 1994-03-23 EP disclosed
US-5252134-A Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing STAUFFER CRAIG M (US) 1993-10-12 US disclosed
WO-1992021789-A1 INTEGRATED DELIVERY SYSTEM FOR CHEMICAL VAPOR FROM NON-GASEOUS SOURCES FOR SEMICONDUCTOR PROCESSING STAUFFER CRAIG M (US) 1992-12-10 WO disclosed