Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 2/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL828536 | 0.73 | — | — | |
| SCHEMBL199897 | 0.73 | — | — | |
| SCHEMBL13532349 | 0.71 | — | — | |
| SCHEMBL14511666 | 0.70 | — | — | |
| SCHEMBL1219364 | 0.69 | — | — | |
| SCHEMBL201416 | 0.69 | — | — | |
| SCHEMBL13525785 | 0.68 | HTT (0.31) | HTTLMNACYP3A4CYP2C9CYP2C19 | |
| SCHEMBL13449539 | 0.67 | CYP3A4 (0.31) | CYP3A4 | |
| SCHEMBL13526009 | 0.67 | — | — | |
| SCHEMBL201169 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524439-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2013-09-03 | — | — | US | claimed |
| US-8148043-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2012-04-03 | — | — | US | claimed |
| US-20090312467-A1 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES | DOW CORNING CORPORATION (US) | 2009-12-17 | — | — | US | claimed |
| JP-2009543135-A | — | — | 2009-12-03 | — | — | JP | claimed |
| US-7625687-B2 | Silsesquioxane resin | DOW CORNING CORPORATION (US) | 2009-12-01 | — | — | US | claimed |
| US-20090202941-A1 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES | DOW CORNING CORPORATION (US) | 2009-08-13 | — | — | US | claimed |
| WO-2008002975-A2 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON- ATTRACTING FUNCTIONALITIES | DOW CORNING CORPORATION (US) | 2008-01-03 | — | — | WO | claimed |
| WO-2008002970-A2 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES | DOW CORNING CORPORATION (US) | 2008-01-03 | — | — | WO | claimed |
| US-20070281242-A1 | Silsesquioxane Resin | DOW SILICONES CORPORATION | 2007-12-06 | — | — | US | claimed |
| EP-1660561-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | Dow Corning Corporation (US) | 2006-05-31 | — | — | EP | claimed |
| WO-2005007747-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING CORPORATION (US) | 2005-01-27 | — | — | WO | claimed |
| EP-1660561-B1 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING (US) | 2014-02-12 | — | — | EP | disclosed |
| US-8524439-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2013-09-03 | — | — | US | disclosed |
| US-8148043-B2 | Silsesquioxane resin systems with base additives bearing electron-attracting functionalities | DOW CORNING CORPORATION (US) | 2012-04-03 | — | — | US | disclosed |
| US-8043788-B2 | Alkali soluble resin; immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-20070281242-A1 | Silsesquioxane Resin | DOW SILICONES CORPORATION | 2007-12-06 | — | — | US | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20070026341-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-1660561-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | Dow Corning Corporation (US) | 2006-05-31 | — | — | EP | disclosed |
| WO-2005007747-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING CORPORATION (US) | 2005-01-27 | — | — | WO | disclosed |