SCHEMBL8884645

SCHEMBL8884645

Cc1ccc(S(=O)(=O)c2ccccc2[N+](=O)[O-])cc1

nearest known ligand 0.77

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.77
MEN1 O00255 1/20 0.70
PAX8 Q06710 1/20 0.59
SMN1; SMN2 Q16637 2/20 0.55
KIF18A Q8NI77 1/20 0.53
CA1 P00915 1/20 0.51
CA2 P00918 1/20 0.51
MMP1 P03956 1/20 0.51
MMP2 P08253 1/20 0.51
MMP9 P14780 1/20 0.51
MMP8 P22894 1/20 0.51
MMP13 P45452 1/20 0.51
ALDH1A1 P00352 4/20 0.50
GAA P10253 1/20 0.50
MAPT P10636 1/20 0.49
HTT P42858 1/20 0.49
HSD17B10 Q99714 1/20 0.48
POLB P06746 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2041279 0.87 KMT2A (1.00) KMT2AMEN1PAX8KIF18ACA1
SCHEMBL11226703 0.84 KMT2A (0.80) KMT2AMEN1KIF18ACA1CA2
SCHEMBL8208093 0.84 KMT2A (0.93) KMT2AMEN1PAX8KIF18ACA1
SCHEMBL27749452 0.84 KMT2A (0.80) KMT2AMEN1KIF18ACA1CA2
SCHEMBL2039879 0.83 KMT2A (1.00) KMT2AMEN1CA1CA2MMP1
SCHEMBL30446303 0.83 KMT2A (1.00) KMT2AMEN1CA1CA2MMP1
SCHEMBL11566827 0.83 KMT2A (1.00) KMT2AMEN1CA1CA2MMP1
SCHEMBL8885322 0.83 KMT2A (0.77) KMT2AMEN1SMN1; SMN2KIF18ACA1
SCHEMBL10898132 0.83 KMT2A (0.77) KMT2AMEN1KIF18ACA1CA2
SCHEMBL28539407 0.83 KMT2A (0.77) KMT2AMEN1SMN1; SMN2KIF18ACA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112574077-B Method for synthesizing sulfone compound under photocatalysis condition 河南大学 2022-02-22 CN disclosed
CN-112574077-A Method for synthesizing sulfone compound under photocatalysis condition 河南大学 2021-03-30 CN disclosed
US-20090092931-A1 Methods of forming a blocking pattern using a photosensitive composition and methods of manufacturing a semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-04-09 US disclosed
US-20090092931-A1 Methods of forming a blocking pattern using a photosensitive composition and methods of manufacturing a semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-04-09 US disclosed
US-7235349-B2 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator HYNIX SEMICONDUCTOR INC. (KR) 2007-06-26 US disclosed
US-7235349-B2 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator HYNIX SEMICONDUCTOR INC. (KR) 2007-06-26 US disclosed
US-5679695-A Aryl and heteroaryl compounds having anti-retrovirus activity THE UNIVERSITY OF CONNECTICUT (US) 1997-10-21 US disclosed
EP-0554377-A4 ARYL AND HETEROARYL COMPOUNDS HAVING ANTI-RETROVIRUS ACTIVITY 1993-10-20 EP disclosed
EP-0554377-A1 ARYL AND HETEROARYL COMPOUNDS HAVING ANTI-RETROVIRUS ACTIVITY THE UNIVERSITY OF CONNECTICUT (US) 1993-08-11 EP disclosed