SCHEMBL8894844

SCHEMBL8894844

CC[SiH2]CC.[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL49670 0.94
Hydrochloric Acid SCHEMBL1032031 0.89
SCHEMBL10684602 0.89
Water SCHEMBL27576839 0.89
Ammonia Solution, Strong SCHEMBL5923703 0.89
Propane SCHEMBL23701103 0.89
Hydrochloric Acid SCHEMBL2253837 0.89
Bromide SCHEMBL5819633 0.89
SCHEMBL21357940 0.89
SCHEMBL27569638 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5637351-A LOW TEMPERATURE VACUUM DEPOSITION AIR PRODUCTS AND CHEMICALS, INC. (US) 1997-06-10 US disclosed
EP-0742290-A1 Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter AIR PRODUCTS AND CHEMICALS, INC. (US) 1996-11-13 EP disclosed