SCHEMBL8898232

SCHEMBL8898232

CCC[Si]1(CCC)[Si](CCC)(CCC)[Si]1(CCC)CCC

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
LMNA P02545 1/20 0.33
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31264969 0.65
SCHEMBL31264965 0.65
SCHEMBL31264986 0.65
Butane SCHEMBL2470336 0.60 TSHR (0.50) TSHRLMNATHRB
Butane SCHEMBL9292387 0.60 TSHR (0.50) TSHRLMNATHRB
Butane SCHEMBL3593 0.60
Butane SCHEMBL1734106 0.60
Butane SCHEMBL8628663 0.60 TSHR (0.50) TSHRLMNATHRB
SCHEMBL8898435 0.59
SCHEMBL585848 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5663271-A Polysilanes and method for producing the same RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) 1997-09-02 US claimed
JP-7010885-A None JP disclosed
EP-0622396-B1 Polysilanes and method for producing the same JAPAN RES DEV CORP (JP) 1997-12-03 EP disclosed
US-5663271-A Polysilanes and method for producing the same RESEARCH DEVELOPMENT CORPORATION OF JAPAN (JP) 1997-09-02 US disclosed
JP-H0710885-A POLYSILANE AND ITS PRODUCTION RES DEV CORP OF JAPAN 1995-01-13 JP disclosed
EP-0622396-A2 Polysilanes and method for producing the same Research Development Corporation of Japan (JP) 1994-11-02 EP disclosed