SCHEMBL890707

SCHEMBL890707

C=CSCC1CSC(CSC=C)CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27580374 0.81
SCHEMBL7627568 0.76
SCHEMBL7638871 0.73
SCHEMBL7630555 0.73
SCHEMBL1275536 0.69
SCHEMBL3628369 0.68
SCHEMBL13867705 0.65
SCHEMBL5163086 0.62
SCHEMBL13636435 0.62
SCHEMBL1276561 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0803504-B1 The process of producing polythiol oligomer HOYA CORP (JP) 2001-09-19 EP claimed
US-5961889-A REACTING 2,5-DIMERCAPTOMETHYL-1,4-DITHIANE (DMMD) WITH SULFUR IN A MOLAR RATIO 2:1 OR 3:2 IN THE PRESENCE OF A BASIC CATALYST HOYA CORPORATION (JP) 1999-10-05 US claimed
EP-0803504-A2 The process of producing polythiol oligomer HOYA CORPORATION (JP) 1997-10-29 EP claimed
US-6391433-B1 None US disclosed
JP-5194486-A None JP disclosed
US-20240254290-A1 POLYMERS OBTAINED FROM UNSATURED COMPOUNDS AND SULFURHALIDES ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA (US) 2024-08-01 US disclosed
WO-2023043737-A1 POLYMERS OBTAINED FROM UNSATURED COMPOUNDS AND SULFURHALIDES ARIZONA BOARD OF REGENTS ON BEHALF OF THE UNIVERSITY OF ARIZONA (US) 2023-03-23 WO disclosed
US-20120082793-A1 DISPERSOID HAVING METAL-OXYGEN BONDS, METAL OXIDE FILM, AND MONOMOLECULAR FILM NIPPON SODA CO., LTD. (JP) 2012-04-05 US disclosed
EP-1422197-B1 DISPERSED INGREDIENT HAVING HAVING METAL- OXYGEN NIPPON SODA CO (JP) 2012-01-11 EP disclosed
US-20110135878-A1 Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film NIPPON SODA, CO., LTD. (JP) 2011-06-09 US disclosed
US-7909929-B2 Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film NIPPON SODA CO., LTD. (JP) 2011-03-22 US disclosed
US-20010003621-A1 Coating composition and thin film layer for optical parts JIANG JIAN (JP) 2001-06-14 US disclosed
US-6194603-B1 FOR PRODUCING POLY(THIO)URETHANES; FOR LENSES; REFRACTIVE INDEX, LOW DIEPERSION HOYA CORPORATION (JP) 2001-02-27 US disclosed
EP-0976728-A1 Polyisocyanate compound, process for the production thereof and optical resin material comprising the same HOYA CORPORATION (JP) 2000-02-02 EP disclosed
EP-0976727-A1 Polyisocyanate compound, process for producing the same and optical resin materials using the same HOYA CORPORATION (JP) 2000-02-02 EP disclosed
EP-0972772-A1 Polyisocyanate compounds, process for producing the same and optical materials using the same HOYA CORPORATION (JP) 2000-01-19 EP disclosed
EP-0964019-A1 Coating composition for optical parts, thin film layer made of it and optical part comprising it HOYA CORPORATION (JP) 1999-12-15 EP disclosed
US-5961889-A REACTING 2,5-DIMERCAPTOMETHYL-1,4-DITHIANE (DMMD) WITH SULFUR IN A MOLAR RATIO 2:1 OR 3:2 IN THE PRESENCE OF A BASIC CATALYST HOYA CORPORATION (JP) 1999-10-05 US disclosed
EP-0803504-A2 The process of producing polythiol oligomer HOYA CORPORATION (JP) 1997-10-29 EP disclosed
JP-H05194486-A VINYL COMPOUND, POLYMER FOR OPTICAL MATERIAL OBTAINED BY USING THE SAME AND OPTICAL PRODUCT HOYA CORP 1993-08-03 JP disclosed