⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2270530 | 0.76 | — | — | |
| SCHEMBL618286 | 0.72 | — | — | |
| Hydrochloric Acid SCHEMBL28490492 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL9564749 | 0.69 | — | — | |
| SCHEMBL28377979 | 0.69 | — | — | |
| SCHEMBL23700998 | 0.69 | — | — | |
| SCHEMBL2103033 | 0.69 | — | — | |
| SCHEMBL2099645 | 0.69 | — | — | |
| SCHEMBL2101262 | 0.67 | — | — | |
| SCHEMBL2102693 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4043470-B1 | TRANSITION METAL COMPOUND AND CATALYST COMPOSITION INCLUDING SAME | LG CHEMICAL LTD (KR) | 2024-11-06 | — | — | EP | disclosed |
| US-20240109923-A1 | TRANSITION METAL COMPOUND AND CATALYST COMPOSITION COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2024-04-04 | — | — | US | disclosed |
| CN-114599661-B | Transition metal compound, method for preparing the same, and catalyst composition comprising the same | 株式会社LG化学 | 2024-03-12 | — | — | CN | disclosed |
| CN-113508123-B | Transition metal compound and catalyst composition comprising the same | 株式会社LG化学 | 2024-01-16 | — | — | CN | disclosed |
| CN-114341072-B | Textured glass articles and methods of making the same | 康宁股份有限公司 | 2023-11-14 | — | — | CN | disclosed |
| CN-115246898-B | Olefin polymerization catalyst, preparation method thereof, composite catalyst containing catalyst and application of composite catalyst | 中国石油化工股份有限公司 | 2023-08-15 | — | — | CN | disclosed |
| EP-3421507-B1 | SUPPORTED HYBRID CATALYST | LG CHEMICAL LTD (KR) | 2023-06-07 | — | — | EP | disclosed |
| CN-115260345-A | Supported diimine catalyst, preparation method thereof, composite catalyst containing supported diimine catalyst and application of composite catalyst | 中国石油化工股份有限公司 | 2022-11-01 | — | — | CN | disclosed |
| CN-115246898-A | Olefin polymerization catalyst, preparation method thereof, composite catalyst containing catalyst and application | 中国石油化工股份有限公司 | 2022-10-28 | — | — | CN | disclosed |
| CN-115246892-A | Single-active-center catalyst, composite catalyst containing same, and preparation method and application of composite catalyst | 中国石油化工股份有限公司 | 2022-10-28 | — | — | CN | disclosed |
| US-10865260-B2 | Supported hybrid catalyst | LG CHEM, LTD. | 2020-12-15 | — | — | US | disclosed |
| EP-3421507-A1 | SUPPORTED HYBRID CATALYST | LG Chem, Ltd. (KR) | 2019-01-02 | — | — | EP | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20120316356-A1 | METHOD FOR HYDROSILYLATION USING A PLATINUM CATALYST | WACKER CHEMIE AG (DE) | 2012-12-13 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20120083620-A1 | METHOD FOR HYDROSILYLATING | WACKER CHEMIE AG (DE) | 2012-04-05 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090182075-A1 | Composition of Asphalt Containing Tapered Block Copolymer | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-07-16 | — | — | US | disclosed |
| EP-2062940-A1 | Composition of asphalt containing tapered block copolymer | Korea Kumho Petrochemical Co., Ltd. (KR) | 2009-05-27 | — | — | EP | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |