Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.44 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.44 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.41 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.41 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.41 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.41 |
| ▸ | THRA | P10827 | 1/20 | 0.40 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.40 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11654714 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL342754 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL1204505 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL342352 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL11869423 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL11141006 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL4153752 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL7717219 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL11138630 | 1.00 | TSHR (0.47) | TSHRHPGDGPR84FFAR1ABCB1 | |
| SCHEMBL57983 | 0.98 | TSHR (0.48) | TSHRHPGDGPR84FFAR1ABCB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120158238-A | Adhesive and protective film thereof | 中国乐凯集团有限公司 | 2025-06-17 | — | — | CN | claimed |
| CN-120048294-A | Photopolymer holographic recording medium, preparation method and application thereof | 珠海莫界科技有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-110845911-A | Ultraviolet curing ink-jet printing ink | 江苏艾森半导体材料股份有限公司 | 2020-02-28 | — | — | CN | claimed |
| CN-120048294-A | Photopolymer holographic recording medium, preparation method and application thereof | 珠海莫界科技有限公司 | 2025-05-27 | — | — | CN | disclosed |
| CN-111807961-B | High-hydroxyl acrylic emulsion with quick drying and long pot life and synthesis method thereof | 万华化学集团股份有限公司 | 2023-05-30 | — | — | CN | disclosed |
| CN-113969079-B | Pigment type water-based ink and ball-point pen containing same | 上海晨光文具股份有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-113969079-A | Pigment type water-based ink and ball pen containing same | 上海晨光文具股份有限公司 | 2022-01-25 | — | — | CN | disclosed |
| WO-2021260944-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, AND SEMICONDUCTOR ELEMENT | 昭和電工マテリアルズ株式会社 | 2021-12-30 | — | — | WO | disclosed |
| WO-2021261448-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT | 昭和電工マテリアルズ株式会社 | 2021-12-30 | — | — | WO | disclosed |
| CN-109810559-B | High-dispersity matte solder resist ink | 江苏艾森半导体材料股份有限公司 | 2021-11-19 | — | — | CN | disclosed |
| CN-109957283-B | High-flame-retardance solder resist ink | 江苏艾森半导体材料股份有限公司 | 2021-09-10 | — | — | CN | disclosed |
| US-5658672-A | BLEND OF A URETHANE POLYACRYLATE COMPOUND, A URETHANE DIACRYLATE OR DIVINYL COMPOUND, ONE OR MORE ADHESION PROMOTERS AND ETHYLENICALLY UNSATURATED COPOLYMERIZABLE MONOMERS; ONE-PART; SOLVENT-FREE | GENCORP INC. (US) | 1997-08-19 | — | — | US | disclosed |
| US-4603181-A | URETHANE, EPOXY RESIN, VINYL MONOMER;COATING FIBERGLASS REINFORCED POLYGTER | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1986-07-29 | — | — | US | disclosed |
| EP-0092624-A2 | Coating composition and hydroxy acrylic copolymer precursor therefor | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-02 | — | — | EP | disclosed |
| US-4394486-A | High solids coatings with enhanced flexibility and impact strength | FORD MOTOR COMPANY (US) | 1983-07-19 | — | — | US | disclosed |
| US-4376187-A | High solids urethane coatings with enhanced flexibility and impact strength | FORD MOTOR COMPANY (US) | 1983-03-08 | — | — | US | disclosed |
| US-4368237-A | ORGANIC SOLVENT-FREE | FUJI PHOTO FILM CO., LTD. (JP) | 1983-01-11 | — | — | US | disclosed |
| US-4158618-A | COATINGS | NATIONAL STARCH AND CHEMICAL CORPORATION (US) | 1979-06-19 | — | — | US | disclosed |
| US-4113792-A | ACRYLIC POLYMERS, CHLOROSULFONATED POLYETHYLENE, INITIATORS | NATIONAL STARCH AND CHEMICAL CORPORATION (US) | 1978-09-12 | — | — | US | disclosed |
| US-4097350-A | HYDROXYALKYL ESTER OF UNSATURATED CARBOXYLIC ACID, FREE RADICAL CATALYST, CYCLIC ANHYDRIDE, EPOXIDE | NATIONAL STARCH AND CHEMICAL CORPORATION (US) | 1978-06-27 | — | — | US | disclosed |