⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11284901 | 0.83 | — | — | |
| SCHEMBL1708440 | 0.81 | — | — | |
| SCHEMBL10495157 | 0.79 | LCK (0.43) | — | |
| SCHEMBL11287146 | 0.79 | LCK (0.43) | — | |
| SCHEMBL11286153 | 0.79 | LCK (0.43) | — | |
| Phosphine SCHEMBL27327625 | 0.79 | LCK (0.39) | — | |
| SCHEMBL11716684 | 0.79 | LCK (0.43) | — | |
| SCHEMBL11353097 | 0.75 | TSHR (0.30) | — | |
| SCHEMBL482706 | 0.75 | — | — | |
| SCHEMBL11353095 | 0.75 | TSHR (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0026088-B1 | PHOTORESIST COMPOSITIONS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-11-23 | — | — | EP | claimed |
| EP-0006089-B1 | PREPARATION OF IMPACT RESISTANT POLYSTYRENE HAVING IMPROVED TRANSPARENCY | THE DOW CHEMICAL COMPANY (US) | 1983-03-02 | — | — | EP | claimed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | claimed |
| EP-0026088-A2 | Photoresist compositions | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-04-01 | — | — | EP | claimed |
| EP-0006089-A1 | Preparation of impact resistant polystyrene having improved transparency | THE DOW CHEMICAL COMPANY (US) | 1980-01-09 | — | — | EP | claimed |
| US-4100228-A | Transparent impact styrene polymer structure | THE DOW CHEMICAL COMPANY (US) | 1978-07-11 | — | — | US | claimed |
| US-4100227-A | Transparent impact-resistant polystyrene structure | THE DOW CHEMICAL COMPANY (US) | 1978-07-11 | — | — | US | claimed |
| US-20240052109-A1 | POLYSILOXANE VINYLIC MONOMERS AND USES THEREOF | ALCON INC. (CH) | 2024-02-15 | — | — | US | disclosed |
| US-5616762-A | Process for the preparation of 3-halo-and pseudohalo-alkylsilane esters | HUELS AKTIENGESELLSCHAFT (DE) | 1997-04-01 | — | — | US | disclosed |
| EP-0322945-B1 | Modification of (co)polymers employing organic peroxides | AKZO NOBEL NV (NL) | 1994-11-02 | — | — | EP | disclosed |
| US-5202386-A | Adhesion to polar material | AKZO NV (NL) | 1993-04-13 | — | — | US | disclosed |
| US-5037892-A | Epoxidation Of Olefin Polymers | AKZO N.V. (NL) | 1991-08-06 | — | — | US | disclosed |
| EP-0322945-A1 | Modification of (co)polymers employing organic peroxides | Akzo Nobel N.V. (NL) | 1989-07-05 | — | — | EP | disclosed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | disclosed |
| EP-0000555-B1 | PROCESS FOR THE PREPARATION OF OXIRANES SUBSTITUTED BY HALOGEN ALKYL | BAYER AG (DE) | 1982-02-10 | — | — | EP | disclosed |
| EP-0006089-A1 | Preparation of impact resistant polystyrene having improved transparency | THE DOW CHEMICAL COMPANY (US) | 1980-01-09 | — | — | EP | disclosed |
| EP-0000555-A1 | Process for the preparation of oxiranes substituted by halogen alkyl | BAYER AG (DE) | 1979-02-07 | — | — | EP | disclosed |
| EP-0000554-A1 | Process for the preparation of oxiranes substituted by halogen alkyl | BAYER AG (DE) | 1979-02-07 | — | — | EP | disclosed |
| US-4100228-A | Transparent impact styrene polymer structure | THE DOW CHEMICAL COMPANY (US) | 1978-07-11 | — | — | US | disclosed |
| US-4100227-A | Transparent impact-resistant polystyrene structure | THE DOW CHEMICAL COMPANY (US) | 1978-07-11 | — | — | US | disclosed |