SCHEMBL8928907

SCHEMBL8928907

O=S(=O)(O)c1cc2cc(S(=O)(=O)O)c(O)cc2cc1O.[NaH]

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.40
LMNA P02545 1/20 0.40
HPGD P15428 1/20 0.40
HIF1A Q16665 1/20 0.40
MPL P40238 4/20 0.37
NT5E P21589 2/20 0.36
COMT P21964 1/20 0.36
AURKA O14965 1/20 0.36
AURKB Q96GD4 1/20 0.36
PRMT1 Q99873 1/20 0.36
EGFR P00533 1/20 0.35
TNNI3 P19429 1/20 0.35
TNNT2 P45379 1/20 0.35
TNNC1 P63316 1/20 0.35
HKDC1 Q2TB90 1/20 0.35
ALDH1A1 P00352 2/20 0.34
CASP1 P29466 1/20 0.34
CASP7 P55210 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CTRC Q99895 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1069208 1.00 HSD17B10 (0.40) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL13353953 0.97 HSD17B10 (0.41) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL391643 0.97 HSD17B10 (0.41) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL30016503 0.97 HSD17B10 (0.41) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL1069210 0.95 HSD17B10 (0.40) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL29566470 0.95 HSD17B10 (0.40) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL6761191 0.90 MPL (0.37) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL27566211 0.87 MPL (0.38) HSD17B10LMNAHPGDHIF1AMPL
Persilic Acid SCHEMBL6930479 0.87 HSD17B10 (0.44) HSD17B10LMNAHPGDHIF1AMPL
SCHEMBL4577867 0.87 MPL (0.46) HSD17B10LMNAHPGDHIF1AMPL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113203728-B Ozone detection device and detection method thereof 四川轻化工大学 2022-07-19 CN claimed
CN-113189089-B Ozone detection reagent and preparation device and preparation method thereof 四川轻化工大学 2022-05-17 CN claimed
CN-113337857-A Acidic sulfate copper electroplating combined additive for thickening PCB through hole metal 厦门大学 2021-09-03 CN claimed
CN-113203728-A Ozone detection device and detection method thereof 四川轻化工大学 2021-08-03 CN claimed
CN-113189089-A Ozone detection reagent and preparation device and preparation method thereof 四川轻化工大学 2021-07-30 CN claimed
CN-112023726-A Low-energy-consumption high-flux reverse osmosis membrane and preparation method and application thereof 万华化学集团股份有限公司 2020-12-04 CN claimed
EP-4611104-A1 NON-AQUEOUS ELECTROLYTE, SODIUM-ION BATTERY CONTAINING SAME, AND ELECTRICAL APPARATUS Contemporary Amperex Technology (Hong Kong) Limited (HK) 2025-09-03 EP disclosed
US-20250219149-A1 NON-AQUEOUS ELECTROLYTE AND SODIUM-ION BATTERY AND ELECTRIC APPARATUS INCLUDING SUCH ELECTROLYTE CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) 2025-07-03 US disclosed
WO-2024152146-A1 NON-AQUEOUS ELECTROLYTE, SODIUM-ION BATTERY CONTAINING SAME, AND ELECTRICAL APPARATUS 宁德时代新能源科技股份有限公司 2024-07-25 WO disclosed
CN-113203728-B Ozone detection device and detection method thereof 四川轻化工大学 2022-07-19 CN disclosed
CN-112023726-B Low-energy-consumption high-flux reverse osmosis membrane and preparation method and application thereof 万华化学集团股份有限公司 2022-07-12 CN disclosed
CN-113337857-B Acidic sulfate copper electroplating combined additive for thickening PCB through hole metal 厦门大学 2022-06-21 CN disclosed
CN-113189089-B Ozone detection reagent and preparation device and preparation method thereof 四川轻化工大学 2022-05-17 CN disclosed
CN-106348691-A Long-life permeable concrete and production method thereof 盼石(上海)新材料科技股份有限公司 2017-01-25 CN disclosed
US-5691099-A DISCOLORATION INHIBITION; PRESERVATION; IMAGE QUALITY RICOH COMPANY, LTD. (JP) 1997-11-25 US disclosed
EP-0122523-A2 Diazotype compositions and materials Andrews Paper and Chemical Co., Inc. (US) 1984-10-24 EP disclosed
US-4467024-A Process for the production of thermo-developable type diazo copying material RICOH CO., LTD. (JP) 1984-08-21 US disclosed
US-4416967-A SUBSTRATE, PRECOAT LAYER OF SILICA AND COPOLYMER OF ACRYLIC, OXY, RICOH CO., LTD. (JP) 1983-11-22 US disclosed
US-4220701-A DIAZO SYSTEM, SEMICONDUCTOR OXIDES WHICH DESORB HYDROXYL IONS UNDER ACTION OF PRIMARY COLOR RADIATION ROVAL S.A. (CH) 1980-09-02 US disclosed
US-3950171-A THERMOPLASTIC RESIN DIAZONIUM SALT MITA INDUSTRIAL CO. LTD. (JA) 1976-04-13 US disclosed