Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9408520 | 1.00 | RECQL (0.35) | RECQLUSP2MAPTTSHRCYP1A2 | |
| SCHEMBL893126 | 0.99 | RECQL (0.36) | RECQLUSP2MAPTTSHR | |
| SCHEMBL10266733 | 0.93 | USP2 (0.40) | RECQLUSP2MAPTTSHRCYP1A2 | |
| SCHEMBL15215201 | 0.87 | USP2 (0.37) | RECQLUSP2MAPTTSHRCYP1A2 | |
| SCHEMBL5399571 | 0.87 | TSHR (0.34) | USP2MAPTTSHR | |
| SCHEMBL8674705 | 0.87 | RECQL (0.38) | RECQL | |
| SCHEMBL9408521 | 0.86 | USP2 (0.32) | USP2MAPTTSHR | |
| SCHEMBL3294145 | 0.86 | USP2 (0.32) | USP2MAPTTSHR | |
| SCHEMBL6128328 | 0.85 | RECQL (0.38) | RECQL | |
| SCHEMBL5385256 | 0.84 | USP2 (0.33) | USP2MAPTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | claimed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | claimed |
| US-7002044-B2 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | THE UNIVERSITY OF CONNECTICUT (US) | 2006-02-21 | — | — | US | claimed |
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | CONNECTICUT, THE UNIVERSITY OF | 2004-05-20 | — | — | US | claimed |
| US-10155903-B2 | Metal etchant compositions and methods of fabricating a semiconductor device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-12-18 | — | — | US | disclosed |
| US-20160204001-A1 | METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | LEE HYOSAN (KR) | 2016-07-14 | — | — | US | disclosed |
| US-20150368557-A1 | METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | CORNELL UNIVERSITY | 2015-12-24 | — | — | US | disclosed |
| US-8951383-B2 | Apparatus for treating wafers using supercritical fluid | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-02-10 | — | — | US | disclosed |
| US-8790470-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-29 | — | — | US | disclosed |
| US-8585917-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-19 | — | — | US | disclosed |
| US-20120085495-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-12 | — | — | US | disclosed |
| US-20120080059-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-05 | — | — | US | disclosed |
| EP-0585062-A1 | Silver halide color photographic-light sensitive material and the image-forming process thereof | KONICA CORPORATION (JP) | 1994-03-02 | — | — | EP | disclosed |
| US-5278040-A | Magenta coupler; oxygen impervious | KONICA CORPORATION (JP) | 1994-01-11 | — | — | US | disclosed |
| US-5272053-A | Silver halide photographic light-sensitive material | KONICA CORPORATION (JP) | 1993-12-21 | — | — | US | disclosed |
| EP-0563946-A1 | Method of manufacturing a silver halide photographic light-sensitive material comprising a silver halide photographic emulsion | KONICA CORPORATION (JP) | 1993-10-06 | — | — | EP | disclosed |
| EP-0553622-A1 | Silver halide photographic light-sensitive material | KONICA CORPORATION (JP) | 1993-08-04 | — | — | EP | disclosed |
| EP-0554027-A1 | Silver halide photographic light sensitive material and its processing method | KONICA CORPORATION (JP) | 1993-08-04 | — | — | EP | disclosed |
| EP-0546711-A1 | Method for forming dye images | KONICA CORPORATION (JP) | 1993-06-16 | — | — | EP | disclosed |
| EP-0530668-A1 | Silver halide photographic light-sensotive material | KONICA CORPORATION (JP) | 1993-03-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | MGAM, NSFL1C, LIPA | RECQL 2797/4885USP2 1727/4885MAPT 2250/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.