SCHEMBL8930513

SCHEMBL8930513

FC1C(F)(F)C(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2028217 0.84
Ammonia Solution, Strong SCHEMBL4349852 0.80
Ammonia Solution, Strong SCHEMBL28967892 0.77
SCHEMBL246076 0.75
SCHEMBL13806014 0.74
SCHEMBL727618 0.74
SCHEMBL8565493 0.72 MEN1 (0.33)
SCHEMBL8569527 0.72 MEN1 (0.33)
SCHEMBL733456 0.72 MEN1 (0.33)
SCHEMBL720011 0.72 MEN1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0350316-B1 Cleaning and drying of electronic assemblies RHONE POULENC CHIMIE (FR) 1997-05-02 EP claimed
US-11574821-B2 Substrate treating method, substrate treating liquid and substrate treating apparatus SCREEN Holdings Co., Ltd. 2023-02-07 US disclosed
US-20220189762-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2022-06-16 US disclosed
US-11302525-B2 Substrate processing method and substrate processing apparatus SCREEN Holdings Co., Ltd. 2022-04-12 US disclosed
US-20210331192-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. 2021-10-28 US disclosed
US-11133175-B2 Substrate treating method and substrate treating apparatus SCREEN Holdings Co., Ltd. 2021-09-28 US disclosed
US-20200135503-A1 SUBSTRATE TREATING METHOD, SUBSTRATE TREATING LIQUID AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2020-04-30 US disclosed
US-20190333755-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-10-31 US disclosed
US-20190176179-A1 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-06-13 US disclosed
EP-2955197-B1 PROCESS FOR PRODUCING POLYTETRAFLUOROETHYLENE MOLDING POWDER AND PROCESS FOR PRODUCING POLYTETRAFLUOROETHYLENE AGGLOMERATED PRODUCT AGC INC (JP) 2019-04-17 EP disclosed
US-20190030576-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-31 US disclosed
EP-3435405-A1 SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS SCREEN Holdings Co., Ltd. (JP) 2019-01-30 EP disclosed
US-10153181-B2 Substrate treating apparatus and substrate treating method SCREEN Holdings Co., Ltd. (JP) 2018-12-11 US disclosed
US-20170345683-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-30 US disclosed
EP-3249682-A1 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD SCREEN Holdings Co., Ltd. (JP) 2017-11-29 EP disclosed
US-9718930-B2 Process for producing polytetrafluoroethylene molding powder and process for producing polytetrafluoroethylene agglomerated product ASAHI GLASS COMPANY, LIMITED (JP) 2017-08-01 US disclosed
EP-2955197-A1 METHOD FOR PRODUCING POLYTETRAFLUOROETHYLENE MOLDING POWDER AND METHOD FOR PRODUCING POLYTETRAFLUOROETHYLENE GRANULATION PRODUCT Asahi Glass Company, Limited (JP) 2015-12-16 EP disclosed
US-20150315342-A1 PROCESS FOR PRODUCING POLYTETRAFLUOROETHYLENE MOLDING POWDER AND PROCESS FOR PRODUCING POLYTETRAFLUOROETHYLENE AGGLOMERATED PRODUCT ASAHI GLASS COMPANY, LIMITED (JP) 2015-11-05 US disclosed
EP-0350316-B1 Cleaning and drying of electronic assemblies RHONE POULENC CHIMIE (FR) 1997-05-02 EP disclosed
EP-0350316-A1 Cleaning and drying of electronic assemblies ISC CHEMICALS LIMITED (GB) 1990-01-10 EP disclosed