Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSPA5 | P11021 | 1/20 | 0.67 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.58 |
| ▸ | CYP2C19 | P33261 | 6/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.51 |
| ▸ | CETP | P11597 | 1/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | ACP3 | P15309 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.47 |
| ▸ | NQO1 | P15559 | 1/20 | 0.47 |
| ▸ | CTRC | Q99895 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31145030 | 1.00 | HSPA5 (0.67) | HSPA5CYP1A2CYP2C19CYP3A4CETP | |
| SCHEMBL599659 | 0.87 | CYP2C19 (0.62) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 | |
| SCHEMBL29490353 | 0.87 | CYP2C19 (0.62) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 | |
| SCHEMBL2536660 | 0.86 | CYP2C19 (0.50) | HSPA5CYP1A2CYP2C19CYP3A4CETP | |
| SCHEMBL31145042 | 0.85 | CYP2C19 (0.53) | CYP1A2CYP2C19CYP3A4CETPCYP2C9 | |
| SCHEMBL11328087 | 0.84 | CYP2C19 (0.60) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 | |
| SCHEMBL659516 | 0.84 | CYP2C19 (0.60) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 | |
| SCHEMBL11339937 | 0.84 | CYP2C19 (0.60) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 | |
| SCHEMBL659517 | 0.84 | CYP2C19 (0.60) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 | |
| SCHEMBL4667060 | 0.84 | CYP2C19 (0.60) | CYP1A2CYP2C19CYP3A4CYP2C9TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5258281-A | Light sensitive silver halide multilayer elements with dyes and heat development accelerators | CANON KABUSHIKI KAISHA (JP) | 1993-11-02 | — | — | US | claimed |
| EP-0486246-A1 | Heat-developable photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1992-05-20 | — | — | EP | claimed |
| EP-4617737-A2 | THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-09-17 | — | — | EP | disclosed |
| US-20250223400-A1 | THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-07-10 | — | — | US | disclosed |
| EP-4506392-A1 | THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-02-12 | — | — | EP | disclosed |
| WO-2023195504-A1 | THERMOPLASTIC RESIN AND OPTICAL LENS INCLUDING SAME | 三菱瓦斯化学株式会社 | 2023-10-12 | — | — | WO | disclosed |
| WO-2023176736-A1 | NOVEL 1,3-BIS(1-METHYL-1-PHENYLETHYL)BENZENE COMPOUND | 本州化学工業株式会社 | 2023-09-21 | — | — | WO | disclosed |
| US-7214743-B2 | Resist lower layer film material and method for forming a pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-5543286-A | CONTAINING AN ORGANIC SILVER SALT AND A PYRROLE COMPOUND;HIGH CONTRAST IMAGES | CANON KABUSHIKI KAISHA (JP) | 1996-08-06 | — | — | US | disclosed |
| EP-0509740-B1 | Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material | CANON KK (JP) | 1996-06-26 | — | — | EP | disclosed |
| US-5262295-A | Biphenyldihydroxide reducing agent for silver halide emulsion layers | CANON KABUSHIKI KAISHA (JP) | 1993-11-16 | — | — | US | disclosed |
| US-5258281-A | Light sensitive silver halide multilayer elements with dyes and heat development accelerators | CANON KABUSHIKI KAISHA (JP) | 1993-11-02 | — | — | US | disclosed |
| EP-0509740-A1 | Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1992-10-21 | — | — | EP | disclosed |
| EP-0505155-A1 | Heat-developable masking layer | CANON KABUSHIKI KAISHA (JP) | 1992-09-23 | — | — | EP | disclosed |
| EP-0486246-A1 | Heat-developable photosensitive material | CANON KABUSHIKI KAISHA (JP) | 1992-05-20 | — | — | EP | disclosed |