Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.62 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.62 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.62 |
| ▸ | RAB9A | P51151 | 1/20 | 0.62 |
| ▸ | HTT | P42858 | 2/20 | 0.60 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.56 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.55 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.55 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.55 |
| ▸ | BLM | P54132 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.54 |
| ▸ | POLB | P06746 | 2/20 | 0.54 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.54 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.50 |
| ▸ | STAT3 | P40763 | 2/20 | 0.50 |
| ▸ | NFKB2 | Q00653 | 2/20 | 0.50 |
| ▸ | RELA | Q04206 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8965219 | 1.00 | MEN1 (0.62) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| SCHEMBL30869298 | 1.00 | MEN1 (0.62) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| SCHEMBL10339187 | 0.80 | MEN1 (0.82) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| SCHEMBL10339186 | 0.80 | MEN1 (0.82) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| Apocynin SCHEMBL109514 | 0.79 | MEN1 (0.75) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| Apocynin SCHEMBL29364797 | 0.79 | MEN1 (0.75) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| Apocynin SCHEMBL464770 | 0.79 | MEN1 (0.75) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| SCHEMBL15842003 | 0.79 | MEN1 (0.74) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| SCHEMBL3861897 | 0.79 | MEN1 (0.64) | MEN1KMT2ASLC22A6SLC22A8RAB9A | |
| Methyl Vanillate SCHEMBL25417789 | 0.78 | KMT2A (0.72) | MEN1KMT2ASLC22A6SLC22A8RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5334481-A | Positive diazo quinone photoresist compositions containing antihalation compound | CIBA-GEIGY CORPORATION (US) | 1994-08-02 | — | — | US | claimed |
| US-5525457-A | Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-06-11 | — | — | US | disclosed |
| EP-0428398-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5399463-A | Process of photopatterning a substrate with a positive photoresist composition containing a diazoquinone photosensitizer | CIBA-GEIGY CORPORATION (US) | 1995-03-21 | — | — | US | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0200129-B1 | POSITIVE PHOTORESIST COMPOSITIONS | CIBA-GEIGY AG (CH) | 1992-02-05 | — | — | EP | disclosed |
| EP-0200129-A2 | Positive photoresist compositions | CIBA-GEIGY AG (CH) | 1986-11-05 | — | — | EP | disclosed |