SCHEMBL8965226

SCHEMBL8965226

CC(C)c1ccc(/C=C/C(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 3/20 0.74
MAPT P10636 5/20 0.69
MAOB P27338 4/20 0.69
RAB9A P51151 4/20 0.69
MAOA P21397 2/20 0.69
CXCL12 P48061 2/20 0.69
POLB P06746 1/20 0.69
ESR1 P03372 1/20 0.64
ESR2 Q92731 1/20 0.64
KMT2A Q03164 4/20 0.63
MEN1 O00255 3/20 0.63
P4HB P07237 3/20 0.63
ALDH1A1 P00352 2/20 0.63
CALM1 P0DP23 1/20 0.63
XDH P47989 1/20 0.63
LMNA P02545 1/20 0.63
GAA P10253 1/20 0.63
CASP3 P42574 1/20 0.63
SENP8 Q96LD8 1/20 0.63
SENP7 Q9BQF6 1/20 0.63

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8977086 1.00 F3 (0.74) F3MAPTMAOBRAB9AMAOA
SCHEMBL25201069 1.00 F3 (0.74) F3MAPTMAOBRAB9AMAOA
SCHEMBL8977082 1.00 F3 (0.74) F3MAPTMAOBRAB9AMAOA
SCHEMBL8965223 1.00 F3 (0.74) F3MAPTMAOBRAB9AMAOA
SCHEMBL10070208 0.93 KDM4E (0.68) F3MAPTMAOBRAB9AMAOA
SCHEMBL977740 0.87 MAPT (0.77) F3MAPTMAOBRAB9AMAOA
SCHEMBL977738 0.87 MAPT (0.77) F3MAPTMAOBRAB9AMAOA
SCHEMBL25198153 0.87 MAPK1 (0.65) F3MAPTMAOBRAB9AMAOA
4,4'-Dihydroxychalcone SCHEMBL25202156 0.86 F3 (1.00) F3MAPTMAOBRAB9AMAOA
SCHEMBL25236411 0.86 F3 (1.00) F3MAPTMAOBRAB9AMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed