SCHEMBL8965812

SCHEMBL8965812

C=Cc1ccc(OC)cc1C(=O)C=Cc1ccc(OC)cc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 6/20 0.66
MAPT P10636 5/20 0.64
MEN1 O00255 3/20 0.64
MAPK1 P28482 3/20 0.64
KMT2A Q03164 3/20 0.64
SMN1; SMN2 Q16637 2/20 0.64
LMNA P02545 2/20 0.64
CYP3A4 P08684 2/20 0.64
CYP2C19 P33261 2/20 0.64
APP P05067 1/20 0.64
TNFRSF1A P19438 1/20 0.64
FLT3 P36888 1/20 0.62
ALDH1A1 P00352 2/20 0.61
HPGD P15428 2/20 0.61
ALOX15 P16050 2/20 0.61
HSD17B10 Q99714 2/20 0.61
KDM4E B2RXH2 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
PDE4A P27815 1/20 0.58
PDE4B Q07343 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL633045 0.81 ABCG2 (0.97) ABCG2MAPTMEN1MAPK1KMT2A
SCHEMBL633046 0.81 ABCG2 (0.97) ABCG2MAPTMEN1MAPK1KMT2A
SCHEMBL25327273 0.81 MAPT (0.89) ABCG2MAPTMEN1MAPK1KMT2A
Metochalcone SCHEMBL4957703 0.78 ABCG2 (1.00) ABCG2MAPTMEN1MAPK1KMT2A
SCHEMBL7198195 0.78 ABCG2 (0.74) ABCG2MAPTMEN1MAPK1KMT2A
Metochalcone SCHEMBL309111 0.78 ABCG2 (1.00) ABCG2MAPTMEN1MAPK1KMT2A
SCHEMBL25189208 0.78 ABCG2 (1.00) ABCG2MAPTMEN1MAPK1KMT2A
SCHEMBL634187 0.78 ABCG2 (1.00) ABCG2MAPTMEN1MAPK1KMT2A
SCHEMBL634186 0.78 ABCG2 (1.00) ABCG2MAPTMEN1MAPK1KMT2A
Metochalcone SCHEMBL29412185 0.78 ABCG2 (1.00) ABCG2MAPTMEN1MAPK1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed