SCHEMBL8967389

SCHEMBL8967389

C=C(C)C(=O)OC(C)C(O)OC(=O)C(=C)C

nearest known ligand 0.43

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.43
ALDH1A1 P00352 2/20 0.42
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965826 0.89 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL8966022 0.87 TSHR (0.41) TSHRALDH1A1THRB
SCHEMBL4734217 0.85 TSHR (0.50) TSHRALDH1A1THRBTDP1
SCHEMBL5177443 0.85 TSHR (0.50) TSHRALDH1A1THRBTDP1
SCHEMBL8965775 0.85 TSHR (0.36) TSHRALDH1A1
SCHEMBL8965613 0.84 TSHR (0.45) TSHRALDH1A1THRBTDP1
SCHEMBL1354723 0.84 TSHR (0.45) TSHRALDH1A1THRBTDP1
SCHEMBL890775 0.84 TSHR (0.45) TSHRALDH1A1THRBTDP1
SCHEMBL5179633 0.84 TSHR (0.45) TSHRALDH1A1THRBTDP1
SCHEMBL484971 0.84 TSHR (0.45) TSHRALDH1A1THRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114245881-A Photosensitive resin composition 日产化学株式会社 2022-03-25 CN disclosed
CN-114174351-A Resin composition 日产化学株式会社 2022-03-11 CN disclosed
CN-104854509-B Coating liquid for forming inorganic oxide coating film, and display device 日产化学工业株式会社 2021-04-13 CN disclosed
CN-112639618-A Negative photosensitive resin composition 日产化学株式会社 2021-04-09 CN disclosed
WO-2021024928-A1 RESIN COMPOSITION 日産化学株式会社 2021-02-11 WO disclosed
CN-105765458-B Negative photosensitive resin composition 日产化学工业株式会社 2020-12-29 CN disclosed
CN-111684358-A Photosensitive resin composition 日产化学株式会社 2020-09-18 CN disclosed
WO-2020044918-A1 NEGATIVE-WORKING PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2020-03-05 WO disclosed
CN-110573963-A Photosensitive resin composition 日产化学株式会社 2019-12-13 CN disclosed
WO-2019156000-A1 PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2019-08-15 WO disclosed
US-5070165-A DENTISTRY, PHOTOPOLYMERIZATION BAYER AKTIENGESELLSCHAFT (DE) 1991-12-03 US disclosed
US-5037926-A Monomers for dentistry BAYER AKTIENGESELLSCHAFT (DE) 1991-08-06 US disclosed
EP-0266589-B1 (METH)-ACRYLIC ACID DERIVATIVES FROM TRIISOCYANATES AND THEIR USE BAYER AG (DE) 1990-12-27 EP disclosed
EP-0400383-A1 Urea groups containing (meth)-acrylic acid derivativs from triisocyanates and their use BAYER AG (DE) 1990-12-05 EP disclosed
EP-0273245-B1 (METH)-ACRYLIC ACID DERIVATIVES FROM TRIISOCYANATES AND THEIR USE BAYER AG (DE) 1990-10-24 EP disclosed
US-4902228-A (Meth)-acrylic acid derivatives of triisocyanates in dentistry BAYER AKTIENGESELLSCHAFT (DE) 1990-02-20 US disclosed
US-4870202-A (Meth)-acrylic acid derivatives of triisocyanates and their use BAYER AKTIENGESELLSCHAFT (DE) 1989-09-26 US disclosed
US-4868325-A (Meth)-acrylic acid derivatives of triisocyanates in dentistry BAYER AKTIENGESELLSCHAFT (DE) 1989-09-19 US disclosed
EP-0273245-A1 (Meth)-acrylic acid derivatives from triisocyanates and their use BAYER AG (DE) 1988-07-06 EP disclosed
EP-0266589-A1 (Meth)-acrylic acid derivatives from triisocyanates and their use BAYER AG (DE) 1988-05-11 EP disclosed