SCHEMBL8970925

SCHEMBL8970925

[SbH6-3].[SbH6-3].[SbH6-3].[SbH6-3].[Zr+4].[Zr+4].[Zr+4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28202775 0.71
SCHEMBL29354192 0.71
SCHEMBL30753794 0.71
Selenium SCHEMBL7732281 0.71
Hydrogen Sulfide SCHEMBL20603104 0.71
SCHEMBL14829129 0.71
SCHEMBL555198 0.50
SCHEMBL2004517 0.50
Hydrochloric Acid SCHEMBL37300 0.50
SCHEMBL230304 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9337421-B2 Multi-layered phase-change memory device FENG CHIA UNIVERSITY (TW) 2016-05-10 US claimed
US-20130292631-A1 Multi-Layered Phase-Change Memory Device FENG CHIA UNIVERSITY (TW) 2013-11-07 US claimed
US-20260129832-A1 SEMICONDUCTOR DEVICE WITH VERTICAL CHANNEL LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORP (TW) 2026-05-07 US disclosed
US-20260129833-A1 SEMICONDUCTOR DEVICE WITH VERTICAL CHANNEL LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORP (TW) 2026-05-07 US disclosed
US-20260129831-A1 SEMICONDUCTOR DEVICE WITH VERTICAL CHANNEL LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORP (TW) 2026-05-07 US disclosed
US-20250385130-A1 SEMICONDUCTOR DEVICE WITH POROUS LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORP (TW) 2025-12-18 US disclosed
US-20250385129-A1 SEMICONDUCTOR DEVICE WITH POROUS LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORP (TW) 2025-12-18 US disclosed
CN-112687662-B Semiconductor element and method for manufacturing the same 南亚科技股份有限公司 2024-03-15 CN disclosed
US-11824082-B2 Method for fabricating semiconductor device with capacitors having shared electrode NANYA TECHNOLOGY CORPORATION (TW) 2023-11-21 US disclosed
US-11605703-B2 Semiconductor device with capacitors having shared electrode and method for fabricating the same NANYA TECHNOLOGY CORPORATION (TW) 2023-03-14 US disclosed
US-20220262894-A1 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE WITH CAPACITORS HAVING SHARED ELECTRODE NANYA TECHNOLOGY CORPORATION (TW) 2022-08-18 US disclosed
US-11315869-B1 Semiconductor device with decoupling unit and method for fabricating the same NANYA TECHNOLOGY CORPORATION (TW) 2022-04-26 US disclosed
US-11145605-B2 Semiconductor device and method for fabricating the same NANYA TECHNOLOGY CORPORATION (TW) 2021-10-12 US disclosed
US-20210118813-A1 SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORPORATION (TW) 2021-04-22 US disclosed
CN-112687662-A Semiconductor element and method for manufacturing the same 南亚科技股份有限公司 2021-04-20 CN disclosed
US-9337421-B2 Multi-layered phase-change memory device FENG CHIA UNIVERSITY (TW) 2016-05-10 US disclosed
CN-103390724-B Ultra-thin and multi-layer structure phase change memory component FENG CHIA UNIVERSITY (CN) 2016-04-06 CN disclosed
CN-103390724-A Ultra-thin and multi-layer structure phase change memory component UNIV FENG CHIA 2013-11-13 CN disclosed
US-20130292631-A1 Multi-Layered Phase-Change Memory Device FENG CHIA UNIVERSITY (TW) 2013-11-07 US disclosed
EP-0697616-A2 Electro-optical fluid composition, device, and fabrication method thereof FUJIKURA LTD. (JP) 1996-02-21 EP disclosed