SCHEMBL8972055

SCHEMBL8972055

CCOc1ccc(C(=O)O)cc1.[NaH]

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLA2G4B P0C869 3/20 0.79
PARP10 Q53GL7 1/20 0.66
TP53 P04637 2/20 0.62
TSHR P16473 1/20 0.62
NPC1 O15118 1/20 0.61
PLK1 P53350 1/20 0.61
RXRA P19793 2/20 0.61
RXRB P28702 2/20 0.61
PKM P14618 2/20 0.60
NFKB1 P19838 1/20 0.58
NFKB2 Q00653 1/20 0.58
RELA Q04206 1/20 0.58
SMN1; SMN2 Q16637 1/20 0.58
MRGPRX4 Q96LA9 1/20 0.58
NQO1 P15559 1/20 0.58
MAPK1 P28482 1/20 0.58
KMT2A Q03164 1/20 0.58
NPSR1 Q6W5P4 1/20 0.58
HTT P42858 1/20 0.57
CA1 P00915 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL177390 0.98 PLA2G4B (0.82) PLA2G4BPARP10TP53TSHRNPC1
Methyl Alcohol SCHEMBL38654507 0.96 PLA2G4B (0.79) PLA2G4BPARP10TP53TSHRNPC1
Benzene SCHEMBL27667496 0.96 PLA2G4B (0.79) PLA2G4BPARP10TP53TSHRNPC1
SCHEMBL28886147 0.96 PLA2G4B (0.79) PLA2G4BPARP10TP53TSHRNPC1
Methoxymethane SCHEMBL9179486 0.94 PLA2G4B (0.77) PLA2G4BPARP10TP53TSHRNPC1
SCHEMBL202683 0.92 PLA2G4B (0.74) PLA2G4BPARP10TP53TSHRNPC1
Terephthalic Acid SCHEMBL28700242 0.89 PLA2G4B (0.70) PLA2G4BPARP10TP53TSHRNPC1
SCHEMBL11672649 0.87 PLA2G4B (0.68) PLA2G4BPARP10TP53TSHRNPC1
Phenetole SCHEMBL28710577 0.86 PLA2G4B (0.66) PLA2G4BPARP10TP53TSHRNPC1
SCHEMBL27635652 0.84 PLA2G4B (0.64) PLA2G4BPARP10TP53TSHRNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0400657-B1 Process for developing of ps plates requiring no dampening water FUJI PHOTO FILM CO LTD (JP) 1996-03-27 EP claimed
US-5290665-A Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative FUJI PHOTO FILM CO., LTD. (JP) 1994-03-01 US claimed
US-4089755-A CATIONIC QUATERNARY AMMONIUM SURFACTANT THE RICHARDSON COMPANY (US) 1978-05-16 US claimed
EP-0400657-B1 Process for developing of ps plates requiring no dampening water FUJI PHOTO FILM CO LTD (JP) 1996-03-27 EP disclosed
US-5290665-A Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative FUJI PHOTO FILM CO., LTD. (JP) 1994-03-01 US disclosed
EP-0400657-A2 Process for developing of ps plates requiring no dampening water Fuji Photo Film Co., Ltd. (JP) 1990-12-05 EP disclosed
US-4444630-A QUATERNARY EMMONIUM PROPOXYLATE SURFACTANT RICHARDSON CHEMICAL COMPANY (US) 1984-04-24 US disclosed
US-4089755-A CATIONIC QUATERNARY AMMONIUM SURFACTANT THE RICHARDSON COMPANY (US) 1978-05-16 US disclosed