SCHEMBL8972208

SCHEMBL8972208

CCCCC=C(C=O)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EP300 Q09472 1/20 0.50
GRIK1 P39086 1/20 0.44
TSHR P16473 1/20 0.42
F7 P08709 2/20 0.39
F3 P13726 2/20 0.39
TERT O14746 3/20 0.35
PTPN1 P18031 3/20 0.35
PPARG P37231 3/20 0.35
PPARD Q03181 3/20 0.35
PPARA Q07869 3/20 0.35
MAPT P10636 2/20 0.35
BLM P54132 2/20 0.35
HSD17B10 Q99714 2/20 0.35
FABP4 P15090 2/20 0.35
GMNN O75496 1/20 0.35
USP2 O75604 1/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
POLB P06746 1/20 0.35
CYP2C9 P11712 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29262761 0.92 EP300 (0.62) EP300TSHRF7F3TERT
SCHEMBL10967046 0.92 EP300 (0.62) EP300TSHRF7F3TERT
SCHEMBL16106122 0.92 EP300 (0.62) EP300TSHRF7F3TERT
SCHEMBL10967052 0.92 EP300 (0.62) EP300TSHRF7F3TERT
SCHEMBL24934164 0.81 EP300 (0.48) EP300GRIK1TSHRF7F3
SCHEMBL10683497 0.81 EP300 (0.48) EP300GRIK1TSHRF7F3
SCHEMBL1900808 0.79 HCAR2 (0.48) EP300GRIK1TSHRF7F3
SCHEMBL8687583 0.78 EP300 (0.46) EP300GRIK1TSHRF7F3
SCHEMBL1659416 0.78 EP300 (0.46) EP300GRIK1TSHRF7F3
SCHEMBL1823090 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4689188-A SILICON CARBIDE IN REACTION BONDED SILICON NITRIDE MATRIX HOT PRESSING, NITRIDING; HIGH PERFORMANCE COMPOSITE THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) 1987-08-25 US claimed
US-5534290-A Surround print process for the manufacture of electrode embedded dielectric green sheets VISATECH CORPORATION (US) 1996-07-09 US disclosed
WO-1995024276-A1 SURROUND PRINT PROCESS FOR THE MANUFACTURE OF ELECTRODE EMBEDDED DIELECTRIC GREEN SHEETS VISTATECH CORPORATION (US) 1995-09-14 WO disclosed
US-4781993-A SILICON CARBIDE, SILICON NITRIDE THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) 1988-11-01 US disclosed
US-4689188-A SILICON CARBIDE IN REACTION BONDED SILICON NITRIDE MATRIX HOT PRESSING, NITRIDING; HIGH PERFORMANCE COMPOSITE THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) 1987-08-25 US disclosed