SCHEMBL8977062

SCHEMBL8977062

Cc1ccc(C(=O)C=Cc2ccc(O)cc2)cc1C

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 3/20 0.69
MAPT P10636 6/20 0.69
RAB9A P51151 4/20 0.69
MAOB P27338 3/20 0.69
MAOA P21397 2/20 0.69
POLB P06746 1/20 0.69
XDH P47989 2/20 0.67
ESR1 P03372 1/20 0.59
ESR2 Q92731 1/20 0.59
CXCL12 P48061 1/20 0.59
KMT2A Q03164 4/20 0.59
MEN1 O00255 3/20 0.59
ALDH1A1 P00352 2/20 0.59
P4HB P07237 2/20 0.59
CALM1 P0DP23 1/20 0.59
LMNA P02545 1/20 0.59
GAA P10253 1/20 0.59
CASP3 P42574 1/20 0.59
SENP8 Q96LD8 1/20 0.59
SENP7 Q9BQF6 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8977060 1.00 F3 (0.69) F3MAPTRAB9AMAOBMAOA
SCHEMBL30384171 0.90 F3 (0.69) F3MAPTRAB9AMAOBMAOA
SCHEMBL8965212 0.90 F3 (0.69) F3MAPTRAB9AMAOBMAOA
SCHEMBL8965208 0.90 F3 (0.69) F3MAPTRAB9AMAOBMAOA
SCHEMBL19193674 0.89 MAPT (0.74) MAPTRAB9AMAOBMAOAPOLB
SCHEMBL19193673 0.88 MAPT (0.58) MAPTRAB9AMAOBMAOAPOLB
SCHEMBL11818074 0.86 MAOB (0.69) MAPTMAOBMAOACXCL12RELA
SCHEMBL11818070 0.86 MAOB (0.69) MAPTMAOBMAOACXCL12RELA
Hydrochloric Acid SCHEMBL11819938 0.84 MAOB (0.68) MAPTMAOBMAOACXCL12RELA
Hydrochloric Acid SCHEMBL11819942 0.84 MAOB (0.68) MAPTMAOBMAOACXCL12RELA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP claimed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US claimed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP claimed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed