Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL8980549

CCCCCCCCCC1CC1.N

nearest known ligand 0.56

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Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 0.56
EPHX1 P07099 1/20 0.50
ALDH1A1 P00352 1/20 0.48
HTT P42858 2/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
LMNA P02545 1/20 0.45
MAPK1 P28482 1/20 0.45
TP53 P04637 1/20 0.45
LSS P48449 2/20 0.44
TSHR P16473 1/20 0.44
THRB P10828 1/20 0.44
PKM P14618 1/20 0.44
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
SIGMAR1 Q99720 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL20473317 1.00 CYP1A2 (0.56) CYP1A2EPHX1ALDH1A1HTTMEN1
Ammonia Solution, Strong SCHEMBL8980765 1.00 CYP1A2 (0.56) CYP1A2EPHX1ALDH1A1HTTMEN1
Ammonia Solution, Strong SCHEMBL28716881 1.00 CYP1A2 (0.56) CYP1A2EPHX1ALDH1A1HTTMEN1
Ammonia Solution, Strong SCHEMBL20492535 1.00 CYP1A2 (0.56) CYP1A2EPHX1ALDH1A1HTTMEN1
Ammonia Solution, Strong SCHEMBL20492545 1.00 CYP1A2 (0.56) CYP1A2EPHX1ALDH1A1HTTMEN1
SCHEMBL6749100 0.97 CYP1A2 (0.59) CYP1A2EPHX1ALDH1A1HTTMEN1
SCHEMBL2048536 0.97
SCHEMBL1847927 0.97 CYP1A2 (0.59) CYP1A2EPHX1ALDH1A1HTTMEN1
SCHEMBL6753110 0.97 CYP1A2 (0.59) CYP1A2EPHX1ALDH1A1HTTMEN1
SCHEMBL997470 0.97 CYP1A2 (0.59) CYP1A2EPHX1ALDH1A1HTTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10543454-B2 Carbon dioxide absorbent UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) 2020-01-28 US claimed
US-20180257023-A1 CARBON DIOXIDE ABSORBENT UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) 2018-09-13 US claimed
CN-110256287-B Synthesis method of high-content N-fatty alkyl-1, 3-propylene diamine 山东汉鸿新材料科技有限公司 2023-03-10 CN disclosed
US-10543454-B2 Carbon dioxide absorbent UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) 2020-01-28 US disclosed
US-20180257023-A1 CARBON DIOXIDE ABSORBENT UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) 2018-09-13 US disclosed
US-5536425-A DURABILITY SONY CORPORATION (JP) 1996-07-16 US disclosed
US-5496485-A ETCHING AND CLEANING SEMICONDUCTOR DEVICES MICRO-IMAGE TECHNOLOGY LIMITED (GB) 1996-03-05 US disclosed
US-5453539-A Durability SONY CORPORATION (JP) 1995-09-26 US disclosed
EP-0640120-A1 ETCHING COMPOSITIONS Micro-Image Technology Limited (GB) 1995-03-01 EP disclosed
WO-1993023493-A1 ETCHING COMPOSITIONS MICRO-IMAGE TECHNOLOGY LIMITED (GB) 1993-11-25 WO disclosed
EP-0519406-A2 Novel perfluoropolyether derivatives, and lubricants and magnetic recording medium using the same SONY CORPORATION (JP) 1992-12-23 EP disclosed