Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP3 | P08254 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 2/20 | 0.31 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.30 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.30 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.30 |
| ▸ | DGKA | P23743 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2759373 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL12215250 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL20465908 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL20465907 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL20364765 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL18119956 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL879158 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL2759386 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL16708704 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 | |
| SCHEMBL2759387 | 0.94 | TSHR (0.38) | TSHRCA1CA2CA12CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11820162-B2 | Pretreatment liquid, ink set, base material for image recording, method of producing base material for image recording, image recording material, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11807023-B2 | Pretreatment liquid, ink set, image recorded material, base material for image recording, method of producing base material for image recording, and image recording method | FUJIFILM CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11773266-B2 | Polymer, molded body, foam, resin composition, and production method for polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230305403-A1 | PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230275259-A1 | INORGANIC SOLID ELECTROLYTE-CONTAINING COMPOSITION, SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230261257-A1 | INORGANIC SOLID ELECTROLYTE-CONTAINING COMPOSITION, SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-20230261198-A1 | SECONDARY BATTERY BINDER COMPOSITION, ELECTRODE COMPOSITION, ELECTRODE SHEET, SECONDARY BATTERY, PRODUCTION METHOD FOR ELECTRODE SHEET, AND PRODUCTION METHOD FOR SECONDARY BATTERY | FUJIFILM CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230194988-A1 | TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20090081367-A1 | Ink set for ink jet recording, ink for ink jet recording, and ink jet image recording method | FUJIFILM CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090047601-A1 | PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |
| US-20080261153-A1 | PLATE MAKING METHOD OF LITHOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM CORPORATION (JP) | 2008-10-23 | — | — | US | disclosed |
| US-20080182205-A1 | Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same | KUNITA KAZUTO | 2008-07-31 | — | — | US | disclosed |
| US-20080160451-A1 | METHOD FOR PREPARATION OF LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2008-07-03 | — | — | US | disclosed |
| US-7306891-B2 | Recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent, and an organic polymer layer with an arithmetic mean roughness Ra of 0.05 to 0.40 mu m on a face of the plate opposite to the recording layer; long-chain alkyl group-containing polymer matting agent | FUJIFILM CORPORATION (JP) | 2007-12-11 | — | — | US | disclosed |
| US-7291441-B2 | Positive resist composition and pattern forming method utilizing the same | FUJIFILM CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20070224535-A1 | Image Forming Method, Planographic Printing Plate Precursor, and Planographic Printing Method | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070077518-A1 | Recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent, and an organic polymer layer with an arithmetic mean roughness Ra of 0.05 to 0.40 mu m on a face of the plate opposite to the recording layer; long-chain alkyl group-containing polymer matting agent | FUJI PHOTO FILM CO., LTD. | 2007-04-05 | — | — | US | disclosed |
| US-20070026344-A1 | Infrared-sensitive planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. | 2007-02-01 | — | — | US | disclosed |