SCHEMBL8987486

SCHEMBL8987486

[CH]c1ccc2ccccc2c1O

nearest known ligand 0.60

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PTPN22 Q9Y2R2 1/20 0.60
HSD17B10 Q99714 2/20 0.50
ALDH1A1 P00352 1/20 0.50
CYP2A6 P11509 1/20 0.50
TSHR P16473 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
LDHA P00338 1/20 0.50
CYP1A2 P05177 2/20 0.46
HPRT1 P00492 1/20 0.46
CYP2D6 P10635 1/20 0.46
CYP2C9 P11712 1/20 0.46
HPGD P15428 1/20 0.46
CYP2C19 P33261 1/20 0.46
HIF1A Q16665 1/20 0.46
ERN1 O75460 1/20 0.45
POLB P06746 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29401627 0.75 PTPN22 (0.65) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
SCHEMBL374807 0.75 PTPN22 (0.65) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
SCHEMBL29613822 0.75 PTPN22 (1.00) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
SCHEMBL28483 0.75 PTPN22 (1.00) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
Hydrochloric Acid SCHEMBL28347175 0.75 PTPN22 (1.00) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
Hydrochloric Acid SCHEMBL27843667 0.75 PTPN22 (1.00) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
SCHEMBL4068022 0.73 PTPN22 (0.95) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
Charcoal, Activated SCHEMBL2574660 0.73 PTPN22 (0.95) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
Water SCHEMBL10892200 0.73 PTPN22 (0.95) PTPN22HSD17B10ALDH1A1CYP2A6TSHR
SCHEMBL5155985 0.73 PTPN22 (0.62) PTPN22HSD17B10ALDH1A1CYP2A6TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0718693-A2 Photoresist compositions and components SHIPLEY COMPANY INC. (US) 1996-06-26 EP disclosed
EP-0273026-A2 Solvents for Photoresist compositions SHIPLEY COMPANY INC. (US) 1988-06-29 EP disclosed