SCHEMBL8990199

SCHEMBL8990199

CCCCCC(C)(C)c1cc(-c2cc(C(C)(C)CCCCC)cc(C(C)(C)CCCCC)c2O)c(O)c(C(C)(C)CCCCC)c1

nearest known ligand 0.49

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 18/20 0.49
CNR2 P34972 18/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL767214 0.91 CNR2 (0.53) CNR1CNR2
SCHEMBL1839235 0.90 CNR2 (0.55) CNR1CNR2
SCHEMBL1837916 0.90 CNR2 (0.55) CNR1CNR2
SCHEMBL1836097 0.90 CNR2 (0.55) CNR1CNR2
SCHEMBL1836711 0.90 CNR2 (0.55) CNR1CNR2
SCHEMBL8395315 0.88 CNR1 (0.38) CNR1CNR2
SCHEMBL6015499 0.87 CNR1 (0.56) CNR1CNR2
SCHEMBL1835022 0.86 CNR2 (0.46) CNR1CNR2
SCHEMBL9321150 0.85 CNR1 (0.58) CNR1CNR2
SCHEMBL11233052 0.83 CNR2 (0.51) CNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP claimed
EP-0509740-B1 Heat-developable photosensitive material and image forming method making use of the heat-developable photosensitive material CANON KK (JP) 1996-06-26 EP disclosed
US-5262295-A Biphenyldihydroxide reducing agent for silver halide emulsion layers CANON KABUSHIKI KAISHA (JP) 1993-11-16 US disclosed
EP-0032681-B1 HINDERED BIS-PHENOL PHENYL PHOSPHITES AND SYNTHETIC RESIN COMPOSITIONS HAVING ENHANCED STABILITY TO HEAT AND LIGHT ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1987-07-22 EP disclosed
US-4362830-A Hindered bis-phenol phenyl phosphites and synthetic resin compositions having enhanced stability to heat and light ADEKA ARGUS CHEMICAL CO., LTD. (JP) 1982-12-07 US disclosed
EP-0032681-A2 Hindered bis-phenol phenyl phosphites and synthetic resin compositions having enhanced stability to heat and light ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1981-07-29 EP disclosed