Silicate

Silicate

SCHEMBL8994756

O=[Si](O)O.[AlH3].[MgH2].[Zr]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Silicate SCHEMBL11729521 0.94
Silicate SCHEMBL14876524 0.94
Silicate SCHEMBL1018 0.94
Silicate SCHEMBL7970582 0.94
Silicate SCHEMBL93958 0.94
Silicate SCHEMBL23200389 0.94
Silicate SCHEMBL643227 0.94
Silicate SCHEMBL1650898 0.94
Silicate SCHEMBL15352553 0.91
Silicate SCHEMBL7206177 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5510300-A LOW TEMPERATURE LEAD OXIDE-BORON OXIDE GLASS MIXTURE SEALS CONSISTING OF SYNTHETIC HEAT-TREATED OXIDE; HIGH SEAL STRENGTH SAMSUNG CORNING CO., LTD. (KR) 1996-04-23 US claimed
JP-7206473-A None JP disclosed
US-5510300-A LOW TEMPERATURE LEAD OXIDE-BORON OXIDE GLASS MIXTURE SEALS CONSISTING OF SYNTHETIC HEAT-TREATED OXIDE; HIGH SEAL STRENGTH SAMSUNG CORNING CO., LTD. (KR) 1996-04-23 US disclosed
US-5510300-A LOW TEMPERATURE LEAD OXIDE-BORON OXIDE GLASS MIXTURE SEALS CONSISTING OF SYNTHETIC HEAT-TREATED OXIDE; HIGH SEAL STRENGTH SAMSUNG CORNING CO., LTD. (KR) 1996-04-23 US disclosed
JP-H07206473-A LOW MELTING POINT ADHESIVE GLASS COMPOSITION USING COMPOSITE FILLER SAMSUNG CORNING CO LTD 1995-08-08 JP disclosed