SCHEMBL8999627

SCHEMBL8999627

CC[Si](CC)(CC)O[Si](CC)(CC)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL302202 0.82
SCHEMBL28689657 0.79
SCHEMBL9709821 0.79
SCHEMBL433375 0.78
SCHEMBL1053325 0.78
SCHEMBL159771 0.72
SCHEMBL44376 0.71
SCHEMBL7699538 0.69
Butane SCHEMBL19927524 0.67
SCHEMBL6382887 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5554570-A PLASMA CHEMICAL VAPOR DEPOSITION OF SILICON, THERMAL VAPOR DEPOSITION OF SILICON OXIDE CANON SALES CO., INC. (JP) 1996-09-10 US disclosed
EP-0664560-A2 Method of forming insulating film CANON SALES CO., INC. (JP) 1995-07-26 EP disclosed