SCHEMBL9006497

SCHEMBL9006497

C/C(=C\c1ccc(OC(F)=C(F)F)cc1)c1ccc(O)cc1

nearest known ligand 0.64

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.64
ESR2 Q92731 3/20 0.64
PTGS1 P23219 9/20 0.55
PTGS2 P35354 7/20 0.55
NQO2 P16083 6/20 0.55
TUBB1 Q9H4B7 1/20 0.39
BCHE P06276 1/20 0.38
ALOX5 P09917 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006679 1.00 ESR1 (0.64) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006682 1.00 ESR1 (0.64) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006506 1.00 ESR1 (0.64) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL8935004 0.94 ESR1 (0.52) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL8935002 0.94 ESR1 (0.52) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006649 0.88 PTGS1 (0.48) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006643 0.88 PTGS1 (0.48) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006603 0.88 PTGS1 (0.48) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006522 0.88 NQO2 (0.58) ESR1ESR2PTGS1PTGS2NQO2
SCHEMBL9006527 0.88 NQO2 (0.58) ESR1ESR2PTGS1PTGS2NQO2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed