SCHEMBL9006733

SCHEMBL9006733

O=C1C(=Cc2ccc(O)cc2)CCCC1=Cc1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.68

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 2/20 0.68
HSD11B1 P28845 2/20 0.68
F3 P13726 2/20 0.68
MGAM O43451 3/20 0.61
GAA P10253 3/20 0.61
SI P14410 3/20 0.61
MGAM2 Q2M2H8 3/20 0.61
EGFR P00533 3/20 0.59
CYP1A2 P05177 5/20 0.58
CYP3A4 P08684 1/20 0.58
MIF P14174 2/20 0.51
MAPT P10636 1/20 0.48
HPGD P15428 1/20 0.48
HTT P42858 1/20 0.48
CYP26A1 O43174 1/20 0.47
F2 P00734 3/20 0.46
F10 P00742 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006727 1.00 CYP2C9 (0.68) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006653 0.94 CYP1A2 (0.60) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006660 0.94 CYP1A2 (0.60) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006531 0.88 CYP1A2 (0.54) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006539 0.88 CYP1A2 (0.54) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006623 0.83 MAPT (0.48) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006627 0.83 MAPT (0.48) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006423 0.83 CYP1A2 (0.48) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006681 0.83 CYP1A2 (0.48) CYP2C9HSD11B1F3MGAMGAA
SCHEMBL9006684 0.83 CYP1A2 (0.48) CYP2C9HSD11B1F3MGAMGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed