⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13725538 | 0.73 | SLC6A4 (0.42) | — | |
| SCHEMBL2063015 | 0.73 | CACNA1F (0.32) | — | |
| SCHEMBL10005572 | 0.73 | SLC6A4 (0.42) | — | |
| SCHEMBL104329 | 0.73 | — | — | |
| SCHEMBL13240336 | 0.70 | — | — | |
| SCHEMBL1997462 | 0.70 | — | — | |
| SCHEMBL29249255 | 0.70 | — | — | |
| SCHEMBL13716925 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL29012713 | 0.70 | — | — | |
| SCHEMBL16017771 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8129555-B2 | Precursors for depositing silicon-containing films and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-03-06 | — | — | US | disclosed |
| US-8129555-B2 | Precursors for depositing silicon-containing films and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-03-06 | — | — | US | disclosed |
| US-20100041243-A1 | Precursors for Depositing Silicon-containing Films and Methods for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| US-20100041243-A1 | Precursors for Depositing Silicon-containing Films and Methods for Making and Using Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-18 | — | — | US | disclosed |
| EP-2154141-A2 | Precursors for depositing silicon-containing films and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-02-17 | — | — | EP | disclosed |