Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EP300 | Q09472 | 1/20 | 0.44 |
| ▸ | TBXAS1 | P24557 | 1/20 | 0.40 |
| ▸ | CD81 | P60033 | 1/20 | 0.36 |
| ▸ | PPARG | P37231 | 1/20 | 0.35 |
| ▸ | ABAT | P80404 | 1/20 | 0.33 |
| ▸ | BACE1 | P56817 | 1/20 | 0.33 |
| ▸ | FNTA | P49354 | 1/20 | 0.33 |
| ▸ | FNTB | P49356 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10478370 | 1.00 | EP300 (0.44) | EP300TBXAS1CD81PPARGABAT | |
| SCHEMBL4286032 | 1.00 | EP300 (0.44) | EP300TBXAS1CD81PPARGABAT | |
| SCHEMBL4223556 | 0.98 | EP300 (0.41) | EP300TBXAS1CD81PPARGABAT | |
| SCHEMBL9722513 | 0.94 | EP300 (0.40) | EP300TBXAS1CD81PPARGABAT | |
| SCHEMBL4283280 | 0.91 | CD81 (0.38) | EP300TBXAS1CD81PPARGABAT | |
| SCHEMBL1325679 | 0.89 | EP300 (0.52) | EP300TBXAS1CD81PPARGFNTA | |
| SCHEMBL4131095 | 0.89 | EP300 (0.52) | EP300TBXAS1CD81PPARGFNTA | |
| SCHEMBL7856915 | 0.89 | EP300 (0.52) | EP300TBXAS1CD81PPARGFNTA | |
| SCHEMBL22572624 | 0.89 | EP300 (0.52) | EP300TBXAS1CD81PPARGFNTA | |
| SCHEMBL19510524 | 0.89 | EP300 (0.52) | EP300TBXAS1CD81PPARGFNTA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8790470-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-29 | — | — | US | disclosed |
| US-8585917-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-19 | — | — | US | disclosed |
| US-20120085495-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-12 | — | — | US | disclosed |
| US-20120080059-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-05 | — | — | US | disclosed |
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | disclosed |
| JP-2008088148-A | DAMAGED HAIR-REPAIRING AGENT AND HAIR COSMETIC MATERIAL | DAITO KASEI KOGYO KK | 2008-04-17 | — | — | JP | disclosed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | disclosed |