⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL10906177 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL28098107 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL27743436 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL8155657 | 0.94 | — | — | |
| Fluoride SCHEMBL15094481 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL27690285 | 0.94 | — | — | |
| SCHEMBL28240415 | 0.93 | — | — | |
| SCHEMBL13531212 | 0.93 | — | — | |
| SCHEMBL15262905 | 0.86 | — | — | |
| Hydrochloric Acid SCHEMBL14635457 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112062111-B | Anti-deposition agent for wet-process phosphoric acid production | 天津正达科技有限责任公司 | 2023-06-16 | — | — | CN | claimed |
| CN-115894309-A | Tertiary amine quaternary ammonium salt sulfonic acid surfactant, and preparation method and application thereof | 山东圳谷新材料科技有限公司 | 2023-04-04 | — | — | CN | claimed |
| US-11441071-B2 | Etchant composition and methods for manufacturing metal pattern and array substrate using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2022-09-13 | — | — | US | claimed |
| CN-113979899-B | Quaternary ammonium salt sulfonic acid type surfactant, and preparation method and application thereof | 山东大学 | 2022-07-29 | — | — | CN | claimed |
| CN-113979899-A | Quaternary ammonium salt sulfonic acid surfactant and preparation method and application thereof | 山东大学 | 2022-01-28 | — | — | CN | claimed |
| WO-2021104483-A1 | SULFONIC ACID QUATERNARY AMMONIUM SALT COMPOUND, PREPARATION METHOD AND APPLICATION THEREOF | 北京耀诚惠仁科技有限公司 | 2021-06-03 | — | — | WO | claimed |
| US-10910412-B2 | Etchant composition, and method for manufacturing metal pattern and array substrate using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2021-02-02 | — | — | US | claimed |
| CN-112062111-A | Anti-deposition agent for wet-process phosphoric acid production | 天津正达科技有限责任公司 | 2020-12-11 | — | — | CN | claimed |
| US-20200172807-A1 | ETCHANT COMPOSITION AND METHODS FOR MANUFACTURING METAL PATTERN AND ARRAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2020-06-04 | — | — | US | claimed |
| US-20190288015-A1 | ETCHANT COMPOSITION, AND METHOD FOR MANUFACTURING METAL PATTERN AND ARRAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2019-09-19 | — | — | US | claimed |
| US-8921230-B2 | Etchant composition, and method of manufacturing a display substrate using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-12-30 | — | — | US | claimed |
| CN-102560580-B | Manufacture technology of nickel-free electroplating gold | SHENZHEN XINYU TENGYUE ELECTRONICS CO., LTD. (CN) | 2014-10-08 | — | — | CN | claimed |
| US-20140295626-A1 | ETCHANT COMPOSITION, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2014-10-02 | — | — | US | claimed |
| CN-102560580-A | Manufacture technology of nickel-free electroplating gold | SHENZHEN ZHONGXING XINYU FPC CO LTD | 2012-07-11 | — | — | CN | claimed |
| CN-101195773-A | High-efficiency composite slurries additive agent and method of use thereof | HANGZHOU BAINENG TECHNOLOGY CO (CN) | 2008-06-11 | — | — | CN | claimed |
| CN-1151999-C | Process for preparing both Heisuojinmeng explosive and TNT-free emulsified explosive | 鲍国利 | 2004-06-02 | — | — | CN | claimed |
| EP-0245836-B1 | THERMOSENSITIVE RECORDING SHEET | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-07-22 | — | — | EP | claimed |
| US-4843058-A | SULFUR CONTAINING DIBASIC ACID ESTER SENSITIZER, COLOR FORMING LACTONE, AND ACID COATING | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1989-06-27 | — | — | US | claimed |
| US-4764500-A | Thermosensitive recording sheet | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1988-08-16 | — | — | US | claimed |
| EP-0245836-A2 | Thermosensitive recording sheet | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1987-11-19 | — | — | EP | claimed |