SCHEMBL9019675

SCHEMBL9019675

CCCCCCC(Oc1ccc(C(C)(C)CC)cc1C(C)(C)CC)C(N)=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 6/20 0.47
NPSR1 Q6W5P4 5/20 0.47
SMN1; SMN2 Q16637 5/20 0.47
MEN1 O00255 4/20 0.47
KMT2A Q03164 4/20 0.47
ALDH1A1 P00352 1/20 0.47
MAPT P10636 5/20 0.39
HTT P42858 3/20 0.39
UBE2N P61088 2/20 0.39
GLA P06280 1/20 0.39
MITF O75030 1/20 0.39
RAD52 P43351 2/20 0.39
STAT3 P40763 1/20 0.39
RCE1 Q9Y256 1/20 0.39
CNR1 P21554 7/20 0.37
CNR2 P34972 7/20 0.37
RAB9A P51151 2/20 0.36
APAF1 O14727 1/20 0.36
HSP90AA1 P07900 1/20 0.36
NOD2 Q9HC29 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9394176 1.00 MAPK1 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL8616165 0.95 MAPK1 (0.49) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL8621078 0.90 MEN1 (0.37) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL9156983 0.90 CNR2 (0.46) CNR1CNR2
SCHEMBL8331140 0.90 MAPK1 (0.48) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL6088428 0.89 MAPK1 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL9394173 0.89 MAPK1 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL8084092 0.89 MAPK1 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
Hydrochloric Acid SCHEMBL9251994 0.89 MAPK1 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A
SCHEMBL10376998 0.89 MAPK1 (0.47) MAPK1NPSR1SMN1; SMN2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5576127-A PATTERN EXPOSING A LIGHT SENSITIVE MATERIAL AND SUBJECTING EXPOSED LIGHT SENSITIVE MATERIAL TO COLOR DEVELOPMENT, BLEACHING, FIXING AND WASHING FUJI PHOTO FILM CO., LTD. (JP) 1996-11-19 US disclosed