SCHEMBL904309

SCHEMBL904309

OC1O[C@H]2C(O)C3CC1C2C3

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ CYP2C9 P11712 1/20 0.32
▸ MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14463072 1.00 CYP2C9 (0.32) CYP2C9MAPT
SCHEMBL10226706 1.00 CYP2C9 (0.32) CYP2C9MAPT
SCHEMBL14950148 0.80 — —
SCHEMBL12018507 0.76 — —
SCHEMBL10458098 0.76 — —
SCHEMBL10456653 0.76 — —
SCHEMBL10668254 0.76 — —
SCHEMBL10660525 0.76 — —
SCHEMBL12460496 0.72 — —
SCHEMBL18697267 0.68 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012043866-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-04-05 — — WO disclosed
EP-2194073-A1 POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION, METHOD FOR PATTERN FORMATION USING THE COMPOSITION, AND RESIN FOR USE IN THE COMPOSITION Fujifilm Corporation (JP) 2010-06-09 — — EP disclosed
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