SCHEMBL904416

SCHEMBL904416

C=CC(=O)OC1CCCCC1C

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.42
EPHX1 P07099 2/20 0.35
TSHR P16473 3/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPK1 P28482 2/20 0.34
HTT P42858 2/20 0.34
RAB9A P51151 2/20 0.34
LMNA P02545 1/20 0.34
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA4 P22748 1/20 0.32
ATM Q13315 1/20 0.31
NPC1 O15118 1/20 0.30
TP53 P04637 1/20 0.30
MAPT P10636 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
TAS1R3 Q7RTX0 1/20 0.30
TAS1R1 Q7RTX1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23493866 0.98 CYP19A1 (0.41) CYP19A1EPHX1TSHRALDH1A1MAPK1
SCHEMBL2220504 0.96 CYP19A1 (0.39) CYP19A1EPHX1TSHRALDH1A1MAPK1
SCHEMBL10750894 0.86 SERPINE1 (0.37) TSHRALDH1A1MAPK1ATMTP53
SCHEMBL12590350 0.85 CYP19A1 (0.31) CYP19A1TSHRALDH1A1MAPK1HTT
SCHEMBL28804667 0.84 CYP19A1 (0.33) CYP19A1EPHX1
SCHEMBL13118857 0.81
SCHEMBL2528815 0.81
SCHEMBL19275518 0.79 CYP19A1 (0.41) CYP19A1EPHX1TSHRALDH1A1MAPK1
SCHEMBL23525937 0.79 EPHX1 (0.34) CYP19A1EPHX1ALDH1A1ATM
SCHEMBL13951037 0.79 ATM (0.38) ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112241107-B Positive photosensitive resin composition, photosensitive resin film and display device using the same 株式会社东进世美肯 2025-03-11 CN claimed
CN-110967927-B Photosensitive resin composition and display device including the same 三星显示有限公司 2025-01-28 CN claimed
CN-111123644-B Photosensitive resin composition, display, and method for forming pattern of display 株式会社东进世美肯 2024-09-03 CN claimed
US-20240241301-A1 POLARIZING PLATE AND OPTICAL DISPLAY APPARATUS Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2024-07-18 US claimed
CN-116360027-A Optical film, polarizing plate including the same, and optical display apparatus including the same 三星SDI株式会社 2023-06-30 CN claimed
US-20230204823-A1 OPTICAL FILM, POLARIZING PLATE COMPRISING THE SAME, AND OPTICAL DISPLAY APPARATUS COMPRISING THE SAME Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2023-06-29 US claimed
CN-116068853-A Photosensitive resin composition and display device 三星显示有限公司 2023-05-05 CN claimed
US-10982061-B2 Photosensitive resin composition and display device including the same SAMSUNG DISPLAY CO., LTD. (KR) 2021-04-20 US claimed
CN-112241107-A Positive photosensitive resin composition, photosensitive resin film, and display device using same 株式会社东进世美肯 2021-01-19 CN claimed
CN-111123644-A Photosensitive resin composition, display, and method for forming pattern of display 株式会社东进世美肯 2020-05-08 CN claimed
CN-106459316-B Photocurable resin composition 株式会社东进世美肯 2020-03-17 CN claimed
CN-104937491-B Photosensitive resin composition and method for forming pattern using the same 东进世美肯株式会社 2020-01-14 CN claimed
CN-105143978-B Photosensitive resin composition, pattern forming method and liquid crystal display device using the same 东进世美肯株式会社 2019-12-13 CN claimed
US-9389451-B2 Photosensitive resin composition, method of forming pattern, and liquid crystal display using the same SAMSUNG DISPLAY CO., LTD. (KR) 2016-07-12 US claimed
US-20140327866-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, AND LIQUID CRYSTAL DISPLAY USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-11-06 US claimed
CN-1311037-C Resin composition and protective film JSR CORP (JP) 2007-04-18 CN claimed
US-20060275700-A1 Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same SAMSUNG ELECTRONICS CO., LTD. 2006-12-07 US claimed
CN-1683461-A Resin composition and protective film JSR CORP (JP) 2005-10-19 CN claimed
US-5530036-A STORAGE STABLE THERMOSETTING RESIN COMPOSITIONS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-25 US claimed
US-5399604-A Thermosetting resin composition comprising /A/ copolymer of unsaturated carboxylic acid or anhydride, unsaturated compound with epoxy group, unsaturated carboxylic acid ester or other vinyl compound, /B/ organic solvent, /C/ silane coupler JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-03-21 US claimed