⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL90093 | 0.82 | — | — | |
| SCHEMBL10445746 | 0.76 | PIK3CD (0.31) | — | |
| SCHEMBL2491993 | 0.75 | — | — | |
| SCHEMBL14513733 | 0.73 | — | — | |
| SCHEMBL4971751 | 0.71 | — | — | |
| SCHEMBL2497710 | 0.71 | — | — | |
| SCHEMBL12559508 | 0.71 | — | — | |
| SCHEMBL18084028 | 0.71 | — | — | |
| SCHEMBL15095963 | 0.71 | — | — | |
| SCHEMBL2497744 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7049275-B2 | Photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-05-23 | — | — | US | claimed |
| US-20260088294-A1 | POSITIVE ELECTRODES AND RECHARGEABLE LITHIUM BATTERIES INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2026-03-26 | — | — | US | disclosed |
| EP-4715884-A1 | POSITIVE ELECTRODES AND RECHARGEABLE LITHIUM BATTERIES INCLUDING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2026-03-25 | — | — | EP | disclosed |
| US-20230235471-A1 | Polyalkanolamines | BASF SE (DE) | 2023-07-27 | — | — | US | disclosed |
| EP-3747870-A1 | PYRIDAZINOL COMPOUND, DERIVATIVE THEREOF, PREPARATION METHOD THEREFOR, HERBICIDAL COMPOSITION AND USE THEREOF | Qingdao KingAgroot Chemical Compound Co., Ltd. (CN) | 2020-12-09 | — | — | EP | disclosed |
| US-9884048-B2 | ERK inhibitors | MERCK SHARP & DOHME CORP. (US) | 2018-02-06 | — | — | US | disclosed |
| US-9879033-B2 | Modulators of 5-HT receptors and methods of use thereof | AbbVie Deutschland GmbH & Co. KG (DE) | 2018-01-30 | — | — | US | disclosed |
| EP-2072496-B1 | METHOD FOR PRODUCING HIGH-PURITY QUATERNARY AMMONIUM SALT | OTSUKA CHEMICAL CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-20170266167-A1 | ERK INHIBITORS | MERCK SHARP & DOHME CORP. (US) | 2017-09-21 | — | — | US | disclosed |
| US-20170266167-A1 | ERK INHIBITORS | MERCK SHARP & DOHME CORP. (US) | 2017-09-21 | — | — | US | disclosed |
| US-20100285243-A1 | COMPOSITION INCLUDING BENZOXAZINE-BASED COMPOUND FOR FORMING BOARD AND BOARD FABRICATED USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-11-11 | — | — | US | disclosed |
| WO-2010094242-A1 | SPIROPYRROLIDINE BETA-SECRETASE INHIBITORS FOR THE TREATMENT OF ALZHEIMER'S DISEASE | MERCK SHARP & DOHME CORP. (US) | 2010-08-26 | — | — | WO | disclosed |
| US-20100044617-A1 | Method for producing high-purity quaternary ammonium salt | STELLA CHEMIFA CORPORATION (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090272933-A1 | Process for production of highly pure quaternary ammonium salt | STELLA CHEMIFA CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| EP-2098518-A1 | PROCESS FOR PRODUCTION OF HIGHLY PURE QUATERNARY AMMONIUM SALT | Otsuka Chemical Co., Ltd. (JP) | 2009-09-09 | — | — | EP | disclosed |
| CN-101516829-A | Method for producing high-purity quaternary ammonium salt | OTSUKA CHEMICAL CO LTD (JP) | 2009-08-26 | — | — | CN | disclosed |
| CN-101516862-A | Method for producing high-purity quaternary ammonium salt | OTSUKA CHEMICAL CO LTD (JP) | 2009-08-26 | — | — | CN | disclosed |
| EP-2072496-A1 | METHOD FOR PRODUCING HIGH-PURITY QUATERNARY AMMONIUM SALT | Otsuka Chemical Co., Ltd. (JP) | 2009-06-24 | — | — | EP | disclosed |
| US-7049275-B2 | Photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-05-23 | — | — | US | disclosed |
| US-20030181344-A1 | Photoresist stripping composition and cleaning composition | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 2003-09-25 | — | — | US | disclosed |