SCHEMBL9099435

SCHEMBL9099435

CC(C)O[Si](CCCOCCCCC1CCO1)(CCCOCCCCC1CCO1)OC(C)C

nearest known ligand 0.42

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.42
TSHR P16473 1/20 0.31
SPHK2 Q9NRA0 1/20 0.30
SPHK1 Q9NYA1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14990983 0.78
SCHEMBL3381884 0.78 EPHX1 (0.58) EPHX1TSHRSPHK2SPHK1
SCHEMBL15253514 0.76 EPHX1 (0.46) EPHX1TSHRSPHK2SPHK1
SCHEMBL20658070 0.76 TSHR (0.55) TSHR
SCHEMBL2472388 0.76 EPHX1 (0.61) EPHX1TSHRSPHK2SPHK1
SCHEMBL3379496 0.76 EPHX1 (0.61) EPHX1TSHRSPHK2SPHK1
SCHEMBL250637 0.76 EPHX1 (0.61) EPHX1TSHRSPHK2SPHK1
SCHEMBL251209 0.76 EPHX1 (0.61) EPHX1TSHRSPHK2SPHK1
SCHEMBL3382033 0.76 EPHX1 (0.61) EPHX1TSHRSPHK2SPHK1
SCHEMBL15253369 0.74 EPHX1 (0.47) EPHX1TSHRSPHK2SPHK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10591816-B2 Photosensitive resin composition, color filter, and liquid crystal display element thereof CHI MEI CORPORATION (TW) 2020-03-17 US disclosed
US-10162260-B2 Photosensitive resin composition, protective film, and liquid crystal display element CHI MEI CORPORATION (TW) 2018-12-25 US disclosed
US-9851638-B2 Photosensitive polysiloxane composition and uses thereof CHI MEI CORPORATION (TW) 2017-12-26 US disclosed
US-20170235224-A1 PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF CHI MEI CORPORATION (TW) 2017-08-17 US disclosed
US-20170168390-A1 PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT CHI MEI CORPORATION (TW) 2017-06-15 US disclosed
US-20170023860-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF CHI MEI CORP (TW) 2017-01-26 US disclosed
US-9541832-B2 Photosensitive resin composition, protective film and element having the same CHI MEI CORPORATION (TW) 2017-01-10 US disclosed
US-9507261-B2 Photosensitive composition, protective film, and element having the protective film CHI MEI CORPORATION (TW) 2016-11-29 US disclosed
US-20160291470-A1 PHOTOSENSITIVE POLYSILOXANE COMPOSITION, PROTECTING FILM, AND ELEMENT HAVING PROTECTIVE FILM CHI MEI CORPORATION (TW) 2016-10-06 US disclosed
US-9395627-B2 Positive photosensitive resin composition and method for forming pattern by using the same CHI MEI CORPORATION 2016-07-19 US disclosed
US-20130299755-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND USES THEREOF CHI MEI CORPORATION (TW) 2013-11-14 US disclosed
US-20130277627-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATIONS OF THE SAME CHI MEI CORPORATION (TW) 2013-10-24 US disclosed
US-20130280541-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF CHI MEI CORPORATION (TW) 2013-10-24 US disclosed
US-8546061-B2 Photo-curing polysiloxane composition and protective film formed from the same CHI MEI CORPORATION (TW) 2013-10-01 US disclosed
US-20130245150-A1 PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF CHI MEI CORPORATION (TW) 2013-09-19 US disclosed
US-20130244177-A1 PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2013-09-19 US disclosed
US-20130228727-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2013-09-05 US disclosed
US-20130142966-A1 BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF CHI MEI CORPORATION (TW) 2013-06-06 US disclosed
US-20130135763-A1 PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION OF THE SAME CHI MEI CORPORATION (TW) 2013-05-30 US disclosed
US-20120141936-A1 PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME CHI MEI CORPORATION (TW) 2012-06-07 US disclosed