SCHEMBL910146

SCHEMBL910146

C=C(C)C(=O)OCCOCCOCCOCCOCCOCCOc1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.57
APEX1 P27695 1/20 0.57
HTT P42858 1/20 0.57
TDP1 Q9NUW8 1/20 0.57
THRB P10828 2/20 0.54
RAB9A P51151 4/20 0.49
SMN1; SMN2 Q16637 4/20 0.49
NPC1 O15118 3/20 0.49
TSHR P16473 1/20 0.49
MTNR1A P48039 1/20 0.47
MTNR1B P49286 1/20 0.47
PKM P14618 1/20 0.47
KDM4E B2RXH2 3/20 0.47
ALDH1A1 P00352 3/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
HPGD P15428 1/20 0.47
NFKB1 P19838 1/20 0.47
NFKB2 Q00653 1/20 0.47
RELA Q04206 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1524744 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
SCHEMBL1173746 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
SCHEMBL152506 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
SCHEMBL1524269 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
SCHEMBL1524479 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
SCHEMBL1524320 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
SCHEMBL437611 1.00 POLB (0.57) POLBAPEX1HTTTDP1THRB
Methacrylic Acid SCHEMBL20496129 0.97 POLB (0.55) POLBAPEX1HTTTDP1THRB
SCHEMBL21371 0.95 TDP1 (0.61) POLBAPEX1HTTTDP1THRB
SCHEMBL28331865 0.94 TDP1 (0.60) POLBAPEX1HTTTDP1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12371583-B2 Pretreatment liquid, ink set, and printed matter ARTIENCE CO., LTD. (JP) 2025-07-29 US disclosed
US-20250122396-A1 PRETREATMENT LIQUID, INK SET, AND PRINTED MATTER ARTIENCE CO., LTD. (JP) 2025-04-17 US disclosed
EP-4410564-A1 PRETREATMENT LIQUID, INK SET, AND PRINTED MATTER Artience Co., Ltd. (JP) 2024-08-07 EP disclosed
US-20240230952-A1 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE FUJIFILM CORPORATION (JP) 2024-07-11 US disclosed
US-20240222788-A1 BINDER DISPERSION FOR NON-AQUEOUS SECONDARY BATTERY SEPARATOR, SLURRY COMPOSITION, NON-AQUEOUS SECONDARY BATTERY SEPARATOR, AND NON-AQUEOUS SECONDARY BATTERY ARTIENCE CO., LTD. (JP) 2024-07-04 US disclosed
US-20230340330-A1 COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-10-26 US disclosed
US-20230324739-A1 COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2023-10-12 US disclosed
CN-116723940-A Printed matter and laminate DIC株式会社 2023-09-08 CN disclosed
CN-114364754-B Printed matter and laminate DIC株式会社 2023-05-12 CN disclosed
WO-2023042737-A1 LAMINATE AND METHOD FOR MANUFACTURING LAMINATE 富士フイルム株式会社 2023-03-23 WO disclosed
US-20100009138-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009137-A1 COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20090247665-A1 FILLER CONTAINING COMPOSITION AND PROCESS FOR PRODUCTION AND USE THEREOF SOLVENTUM INTELLECTUAL PROPERTIES COMPANY 2009-10-01 US disclosed
EP-2053087-A1 RESIN COMPOSITION FOR OPTICAL USE, RESIN MATERIAL FOR OPTICAL USE USING THE SAME, OPTICAL FILTER FOR IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE Hitachi Chemical Co., Ltd. (JP) 2009-04-29 EP disclosed
US-20080009582-A1 PROCESS FOR PRODUCING POLYMER, COATING COMPOSITION AND COATED ARTICLE ASAHI GLASS CO., LTD. (JP) 2008-01-10 US disclosed
EP-1852444-A1 METHOD FOR PRODUCING POLYMER, COATING COMPOSITION AND COATED ARTICLE Asahi Glass Company, Limited (JP) 2007-11-07 EP disclosed
EP-0903225-B1 Light sensitive composition and image forming material KONISHIROKU PHOTO IND (JP) 2004-09-22 EP disclosed
US-20030225239-A1 Michael addition type urethane urea resin, production process therefor, adhesive, production process therefor, coating agent for forming ink receiving layer and recording material TOYO INK MANUFACTURING CO., LTD. (JP) 2003-12-04 US disclosed
US-6051361-A PHOTOSENSITIVE MIXTURE COMPRISING A COMPOUND CAPABLE OF GENERATING AN ACID ON EXPOSURE OF ACTINIC LIGHT, A COMPOUND CAN BE CROSSLINKING BY AN ACID, AN INFRARED ABSORBER AND AN ADDITIONAL POLYMER KONICA CORPORATION (JP) 2000-04-18 US disclosed
EP-0903225-A2 Light sensitive composition and image forming material KONICA CORPORATION (JP) 1999-03-24 EP disclosed