Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | SPHK2 | Q9NRA0 | 2/20 | 0.34 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15253369 | 0.83 | EPHX1 (0.47) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL31313174 | 0.81 | EPHX1 (0.56) | EPHX1ALDH1A1 | |
| SCHEMBL2472388 | 0.80 | EPHX1 (0.61) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL3382033 | 0.80 | EPHX1 (0.61) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL3379496 | 0.80 | EPHX1 (0.61) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL250637 | 0.80 | EPHX1 (0.61) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL251209 | 0.80 | EPHX1 (0.61) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL3381884 | 0.78 | EPHX1 (0.58) | EPHX1ALDH1A1TDP1SPHK2SPHK1 | |
| SCHEMBL9101314 | 0.77 | EPHX1 (0.55) | EPHX1ALDH1A1 | |
| SCHEMBL23581902 | 0.76 | EPHX1 (0.46) | EPHX1ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| US-20170168390-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | CHI MEI CORPORATION (TW) | 2017-06-15 | — | — | US | disclosed |
| US-20170023860-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORP (TW) | 2017-01-26 | — | — | US | disclosed |
| US-9541832-B2 | Photosensitive resin composition, protective film and element having the same | CHI MEI CORPORATION (TW) | 2017-01-10 | — | — | US | disclosed |
| US-9507261-B2 | Photosensitive composition, protective film, and element having the protective film | CHI MEI CORPORATION (TW) | 2016-11-29 | — | — | US | disclosed |
| US-9395627-B2 | Positive photosensitive resin composition and method for forming pattern by using the same | CHI MEI CORPORATION | 2016-07-19 | — | — | US | disclosed |
| US-9389509-B2 | Photosensitive polysiloxane composition, protecting film and element having the protecting film | CHI MEI CORPORATION (TW) | 2016-07-12 | — | — | US | disclosed |
| US-9298091-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2016-03-29 | — | — | US | disclosed |
| US-20150378256-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM AND ELEMENT HAVING THE SAME | CHI MEI CORPORATION (TW) | 2015-12-31 | — | — | US | disclosed |
| US-8722755-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2014-05-13 | — | — | US | disclosed |
| US-20130310497-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-11-21 | — | — | US | disclosed |
| US-20130299755-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR A COLOR FILTER AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-11-14 | — | — | US | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130260108-A1 | PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-10-03 | — | — | US | disclosed |
| US-8546061-B2 | Photo-curing polysiloxane composition and protective film formed from the same | CHI MEI CORPORATION (TW) | 2013-10-01 | — | — | US | disclosed |
| US-20130245150-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-09-19 | — | — | US | disclosed |
| US-20130144005-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-20130142966-A1 | BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-20120141936-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND PROTECTIVE FILM FORMED FROM THE SAME | CHI MEI CORPORATION (TW) | 2012-06-07 | — | — | US | disclosed |