⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14562463 | 1.00 | — | — | |
| SCHEMBL12446446 | 1.00 | — | — | |
| SCHEMBL302038 | 0.94 | — | — | |
| SCHEMBL14562477 | 0.94 | — | — | |
| SCHEMBL10045989 | 0.78 | — | — | |
| SCHEMBL10045933 | 0.78 | — | — | |
| SCHEMBL10045987 | 0.78 | — | — | |
| SCHEMBL10046007 | 0.78 | — | — | |
| SCHEMBL10046039 | 0.78 | — | — | |
| SCHEMBL14368923 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5460792-A | Removal and destruction of halogenated organic and hydrocarbon compounds with porous carbonaceous materials | ROHM AND HAAS COMPANY (US) | 1995-10-24 | — | — | US | disclosed |
| US-5403798-A | Using catalyst with pyropolymer substrate doped with metal oxide, metal oxyhalide formed from metal salts by hydrolysis or decomposition | ROHM AND HAAS COMPANY (US) | 1995-04-04 | — | — | US | disclosed |
| EP-0604110-A1 | Destruction of organic compounds | ROHM AND HAAS COMPANY (US) | 1994-06-29 | — | — | EP | disclosed |
| EP-0295211-B1 | Photoresist composition | CIBA GEIGY AG (CH) | 1994-03-16 | — | — | EP | disclosed |
| US-5124233-A | PHOTORESIST COMPOSITIONS | CIBA-GEIGY CORPORATION (US) | 1992-06-23 | — | — | US | disclosed |
| EP-0295211-A2 | Photoresist composition | CIBA-GEIGY AG (CH) | 1988-12-14 | — | — | EP | disclosed |
| EP-0153904-B1 | PROCESS FOR THE PREPARATION OF A PROTECTION LAYER OR A RELIEF PATTERN | CIBA-GEIGY AG (CH) | 1988-09-14 | — | — | EP | disclosed |
| US-4624912-A | EXPOSURE TO ELECTRON OR ACTINIC RADIATION, THEN HEATING | CIBA-GEIGY CORPORATION (US) | 1986-11-25 | — | — | US | disclosed |
| US-4229274-A | PHOTOINITIATOR, PHOTOSENSITIZER, QUENCHER, AND COMPOUNDS CONTAINING ACRYLYLOXY GROUPS | PPG INDUSTRIES, INC. (US) | 1980-10-21 | — | — | US | disclosed |