Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | CTSK | P43235 | 2/20 | 0.34 |
| ▸ | CTSL | P07711 | 1/20 | 0.34 |
| ▸ | CTSB | P07858 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | SHBG | P04278 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92857 | 0.86 | NR5A2 (0.34) | TSHRCTSKCTSLCTSB | |
| SCHEMBL19854113 | 0.81 | TSHR (0.39) | TSHRMAPT | |
| SCHEMBL1577727 | 0.79 | TSHR (0.48) | TSHRCTSKALDH1A1MAPT | |
| SCHEMBL19853815 | 0.79 | MAPT (0.35) | TSHRMAPT | |
| SCHEMBL31757150 | 0.77 | TSHR (0.47) | TSHRCTSKALDH1A1MAPT | |
| SCHEMBL1493259 | 0.76 | TSHR (0.50) | TSHRCTSKALDH1A1MAPT | |
| SCHEMBL1692337 | 0.76 | TSHR (0.46) | TSHRCTSKALDH1A1MAPT | |
| SCHEMBL4132684 | 0.76 | TSHR (0.46) | TSHRCTSKCTSLCTSBALDH1A1 | |
| SCHEMBL10528809 | 0.75 | TSHR (0.53) | TSHRMAPT | |
| SCHEMBL866130 | 0.75 | TSHR (0.53) | TSHRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8129100-B2 | Double patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20100304297-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20090253084-A1 | DOUBLE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |