SCHEMBL915435

SCHEMBL915435

CCOP(=O)(O)Cc1cccc2cc3ccccc3c(OCCOC)c12

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 1/20 0.41
ACP3 P15309 1/20 0.37
HPGD P15428 2/20 0.36
KDM4E B2RXH2 2/20 0.36
LMNA P02545 1/20 0.36
ALDH1A1 P00352 3/20 0.34
GPR84 Q9NQS5 1/20 0.34
S1PR1 P21453 1/20 0.32
S1PR3 Q99500 1/20 0.32
GRM4 Q14833 1/20 0.32
KDM1A O60341 1/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
SLC2A1 P11166 1/20 0.32
THRB P10828 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
PTK2B Q14289 1/20 0.32
FDPS P14324 1/20 0.31
PLA2G2D Q9UNK4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915816 0.91 NR1I2 (0.41) NR1I2ACP3HPGDKDM4ELMNA
SCHEMBL916856 0.90 NR1I2 (0.39) NR1I2ACP3HPGDKDM4ELMNA
SCHEMBL915810 0.89 ACP3 (0.50) NR1I2ACP3KDM4EALDH1A1GPR84
SCHEMBL31688380 0.89 ACP3 (0.50) NR1I2ACP3KDM4EALDH1A1GPR84
SCHEMBL916857 0.86 ACP3 (0.34) NR1I2ACP3KDM4EALDH1A1GPR84
SCHEMBL915367 0.82 NR1I2 (0.41) NR1I2ACP3HPGDKDM4ELMNA
SCHEMBL915418 0.81 NR1I2 (0.46) NR1I2ACP3HPGDKDM4ELMNA
SCHEMBL925190 0.79 NR1I2 (0.42) NR1I2ACP3HPGDKDM4ELMNA
SCHEMBL916661 0.78 KDM4E (0.47) NR1I2ACP3HPGDKDM4ELMNA
SCHEMBL915368 0.78 ACP3 (0.34) NR1I2ACP3GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed