⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1482242 | 0.61 | — | — | |
| SCHEMBL3943475 | 0.61 | — | — | |
| SCHEMBL9471431 | 0.52 | — | — | |
| SCHEMBL3945457 | 0.52 | — | — | |
| SCHEMBL274532 | 0.52 | — | — | |
| SCHEMBL18148592 | 0.51 | — | — | |
| SCHEMBL88190 | 0.51 | — | — | |
| SCHEMBL1758633 | 0.48 | — | — | |
| SCHEMBL2811107 | 0.46 | — | — | |
| SCHEMBL17796889 | 0.46 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11814561-B2 | Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same | KANTO DENKA KOGYO CO., LTD. (JP) | 2023-11-14 | — | — | US | claimed |
| US-11795396-B2 | Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same | KANTO DENKA KOGYO CO., LTD. (JP) | 2023-10-24 | — | — | US | claimed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | claimed |
| US-10872784-B2 | Etching gas mixture, method of forming pattern by using the same, and method of manufacturing integrated circuit device by using the etching gas mixture | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2020-12-22 | — | — | US | claimed |
| US-20200388881-A1 | SILICON-BASED ENERGY STORAGE DEVICES WITH FUNCTIONAL THIOPHENE COMPOUNDS OR DERIVATIVES OF THIOPHENE CONTAINING ELECTROLYTE ADDITIVES | ENEVATE CORPORATION | 2020-12-10 | — | — | US | claimed |
| EP-0557272-B1 | PROCESS FOR THE PREPARATION OF DIFLUOROMALEIC ANHYDRIDE AND INTERMEDIATE COMPOUNDS PRODUCED THEREBY | DU PONT (US) | 1995-03-08 | — | — | EP | claimed |
| EP-0557272-A1 | PROCESS FOR THE PREPARATION OF DIFLUOROMALEIC ANHYDRIDE AND INTERMEDIATE COMPOUNDS PRODUCED THEREBY. | DU PONT (US) | 1993-09-01 | — | — | EP | claimed |
| WO-1992008710-A1 | PROCESS FOR THE PREPARATION OF DIFLUOROMALEIC ANHYDRIDE AND INTERMEDIATE COMPOUNDS PRODUCED THEREBY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-05-29 | — | — | WO | claimed |
| US-5112993-A | Process for the preparation of difluoromaleic anhydride | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-05-12 | — | — | US | claimed |
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | disclosed |
| US-20240234031-A1 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR APPARATUS AND ELECTRONIC APPARATUS INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-11 | — | — | US | disclosed |
| US-11814561-B2 | Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same | KANTO DENKA KOGYO CO., LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11814561-B2 | Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same | KANTO DENKA KOGYO CO., LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11795396-B2 | Dry etching gas composition comprising sulfur-containing fluorocarbon compound having unsaturated bond and dry etching method using the same | KANTO DENKA KOGYO CO., LTD. (JP) | 2023-10-24 | — | — | US | disclosed |
| US-5235069-A | Process for the preparation of difluoromaleic anhydride and intermediate compounds produced thereby | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-10 | — | — | US | disclosed |
| US-5235069-A | Process for the preparation of difluoromaleic anhydride and intermediate compounds produced thereby | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-10 | — | — | US | disclosed |
| WO-1992008710-A1 | PROCESS FOR THE PREPARATION OF DIFLUOROMALEIC ANHYDRIDE AND INTERMEDIATE COMPOUNDS PRODUCED THEREBY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-05-29 | — | — | WO | disclosed |
| WO-1992008710-A1 | PROCESS FOR THE PREPARATION OF DIFLUOROMALEIC ANHYDRIDE AND INTERMEDIATE COMPOUNDS PRODUCED THEREBY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-05-29 | — | — | WO | disclosed |
| US-5112993-A | Process for the preparation of difluoromaleic anhydride | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-05-12 | — | — | US | disclosed |
| US-5112993-A | Process for the preparation of difluoromaleic anhydride | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-05-12 | — | — | US | disclosed |