SCHEMBL915525

SCHEMBL915525

CCOP(=O)(O)Cc1ccc([N+](=O)[O-])cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.59
CA1 P00915 2/20 0.56
CA2 P00918 2/20 0.56
BCHE P06276 1/20 0.56
ACHE P22303 1/20 0.56
TSHR P16473 2/20 0.55
ALDH1A1 P00352 2/20 0.55
CYP3A4 P08684 1/20 0.55
MAPK1 P28482 1/20 0.55
HSD17B10 Q99714 1/20 0.55
KDM4E B2RXH2 1/20 0.49
CES2 O00748 1/20 0.47
CES1 P23141 1/20 0.47
IDO1 P14902 2/20 0.45
LOXL2 Q9Y4K0 1/20 0.44
PGK1 P00558 1/20 0.44
PGK2 P07205 1/20 0.44
LMNA P02545 1/20 0.44
CYP2C19 P33261 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL78561 0.85 CA1 (0.58) AKR1C3CA1CA2BCHEACHE
SCHEMBL17488978 0.84 PPARD (0.50) TSHRPGK1PGK2CYP2C19
SCHEMBL2031961 0.84 CA1 (0.56) AKR1C3CA1CA2BCHEACHE
SCHEMBL4131256 0.83 CA1 (0.55) AKR1C3CA1CA2BCHEACHE
SCHEMBL2030185 0.83 CA1 (0.55) AKR1C3CA1CA2BCHEACHE
SCHEMBL28073350 0.82 AKR1C3 (0.57) AKR1C3CA1CA2BCHEACHE
SCHEMBL4923182 0.82 GRM8 (0.51) CA1CA2BCHEACHETSHR
SCHEMBL503476 0.81 AKR1C3 (0.49) AKR1C3CA1CA2BCHEACHE
SCHEMBL4998799 0.80 CA1 (0.52) AKR1C3CA1CA2BCHEACHE
SCHEMBL21815480 0.80 AKR1C3 (0.57) AKR1C3CA1CA2ACHETSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed