⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4815967 | 0.67 | — | — | |
| SCHEMBL368671 | 0.58 | — | — | |
| SCHEMBL9615101 | 0.58 | — | — | |
| SCHEMBL5891985 | 0.58 | — | — | |
| SCHEMBL29019834 | 0.58 | — | — | |
| SCHEMBL5383540 | 0.58 | — | — | |
| SCHEMBL3965104 | 0.52 | — | — | |
| Ethane SCHEMBL11324909 | 0.41 | — | — | |
| SCHEMBL106287 | 0.41 | — | — | |
| Ethane SCHEMBL11665218 | 0.41 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117712383-A | Current collector, current collector preparation method and battery | 深圳金美新材料科技有限公司 | 2024-03-15 | — | — | CN | disclosed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-117054401-A | Method for detecting rhodium content in carbon-supported rhodium heterogeneous catalyst | 西安凯立新材料股份有限公司 | 2023-11-14 | — | — | CN | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| CN-115916752-A | Aryltetrahydropyridine derivatives or salts thereof, and pesticides containing the same and methods of use thereof | 日本农药株式会社 | 2023-04-04 | — | — | CN | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| CN-115443347-A | Organoamino-functional cyclic oligosiloxanes for depositing silicon-containing films | 弗萨姆材料美国有限责任公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-114057694-A | Preparation method of 7-maleimide indole compound | 温州医科大学 | 2022-02-18 | — | — | CN | disclosed |
| CN-113840826-A | Organoamino-functional cyclic oligosiloxanes for depositing silicon-containing films | 弗萨姆材料美国有限责任公司 | 2021-12-24 | — | — | CN | disclosed |
| CN-113735832-A | Preparation method of 7-succinimide indole compound | 温州医科大学 | 2021-12-03 | — | — | CN | disclosed |
| CN-1382129-A | Substituted benzylthiazolidine-2,4-dione derivatives | KYORIN SEIYAKU KK (JP) | 2002-11-27 | — | — | CN | disclosed |
| CN-1228775-A | Benzofurans and benzopyrans as chronobiological agents | GLAXO GROUP LTD (GB) | 1999-09-15 | — | — | CN | disclosed |
| EP-0514546-B1 | CHROMENE DERIVATIVES, THEIR PRODUCTION AND USE | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1995-01-04 | — | — | EP | disclosed |
| US-5278186-A | Substituted with secondary amide | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1994-01-11 | — | — | US | disclosed |
| EP-0514546-A1 | CHROMENE DERIVATIVES, THEIR PRODUCTION AND USE. | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1992-11-25 | — | — | EP | disclosed |
| WO-1991012249-A1 | CHROMENE DERIVATIVES, THEIR PRODUCTION AND USE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1991-08-22 | — | — | WO | disclosed |
| CN-1049343-A | The 2-tetrahydroglyoxaline and preparation and the purposes that replace | NOVO NORDISK AS (DK) | 1991-02-20 | — | — | CN | disclosed |
| US-4405469-A | SILICON-CARBON BONDS, ESTER GROUPS | CONSORTIUM FUR ELEKTROCHEMISCHE IND. GMBH (DE) | 1983-09-20 | — | — | US | disclosed |
| US-4322473-A | FIBER COATING | CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) | 1982-03-30 | — | — | US | disclosed |
| US-4207246-A | REACTING UNSATURATED DIESTER WITH ORGANOSILOXANE CONTAINING SILICONBONDED HYDROGEN, CATALYST | Consortium f/ur Elektrochemische Industrie GmbH (DE) | 1980-06-10 | — | — | US | disclosed |