SCHEMBL9158019

SCHEMBL9158019

C[C](C)C=C(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2728627 0.80
SCHEMBL819848 0.80
SCHEMBL5894 0.80
SCHEMBL2728623 0.80
SCHEMBL28517 0.80
SCHEMBL5893 0.80
SCHEMBL623803 0.80 HTT (0.45)
SCHEMBL28872731 0.80 PTGS1 (0.39)
SCHEMBL623108 0.80 HTT (0.45)
SCHEMBL27531633 0.80 HTT (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0125405-B2 Silver halide light-sensitive material FUJI PHOTO FILM CO LTD (JP) 1995-01-04 EP disclosed
EP-0205121-B1 PROCESSING METHOD FOR SILVER HALIDE COLOR PHOTOSENSITIVE MATERIALS FUJI PHOTO FILM CO., LTD. (JP) 1991-06-26 EP disclosed
EP-0125405-B1 SILVER HALIDE LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1988-07-06 EP disclosed
EP-0205121-A2 Processing method for silver halide color photosensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1986-12-17 EP disclosed
US-4539289-A LIGHT SENSITIVE ELEMENTS FUJI PHOTO FILM CO., LTD. (JP) 1985-09-03 US disclosed
US-4508817-A WITH LOW TOXICITY AND HIGH BLEACHING RATES FUJI PHOTO FILM CO., LTD. (JP) 1985-04-02 US disclosed
EP-0125405-A2 Silver halide light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1984-11-21 EP disclosed