SCHEMBL9174201

SCHEMBL9174201

FC(F)C(F)(F)[Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9715907 0.73
SCHEMBL9715875 0.73
SCHEMBL191118 0.73
SCHEMBL29480434 0.67
SCHEMBL31182149 0.67
SCHEMBL8812433 0.67
SCHEMBL2801960 0.64
SCHEMBL10901124 0.63 KDM4E (0.38)
SCHEMBL5034198 0.62
SCHEMBL15091580 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4368476-A TREATED WITH A FLUORINE CONTAINING COMPOUND CANON KABUSHIKI KAISHA (JP) 1983-01-11 US claimed
EP-0388979-B1 Derivative compound of 1,3- or 1,4-bis(hexafluoroisopropyl) benzene, or 2,2-bisphenylhexafluoropropane, ink-repellent agent containing such derivative compound, head for ink jet recording treated with such ink-repellent agent and ink jet recording device equipped with such head CANON KK (JP) 1995-06-14 EP disclosed
US-5098981-A POLYORGANOSILOXANE CHISSO CORPORATION (JP) 1992-03-24 US disclosed
US-5043747-A Thin layer of fluorine-containing acrylic or epoxide polymer CANON KABUSHIKI KAISHA (JP) 1991-08-27 US disclosed
EP-0388979-A2 Derivative compound of 1,3- or 1,4-bis(hexafluoroisopropyl) benzene, or 2,2-bisphenylhexafluoropropane, ink-repellent agent containing such derivative compound, head for ink jet recording treated with such ink-repellent agent and ink jet recording device equipped with such head CANON KABUSHIKI KAISHA (JP) 1990-09-26 EP disclosed
EP-0349920-A2 Polyorganosiloxane Chisso Corporation (JP) 1990-01-10 EP disclosed
US-4292029-A APPLYING FLUOROPOLYMER OR MONOMERS TO SURFACE UNIVERSITY OF MICHIGAN (US) 1981-09-29 US disclosed