Silicate

Silicate

SCHEMBL918286

O=[Si](O)O.O=[Si]=O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Silicate SCHEMBL273085 0.95
Silicate SCHEMBL336520 0.82
Silicate SCHEMBL1169 0.82
Silicate SCHEMBL981237 0.82
Silicate SCHEMBL21268596 0.82
Silicate SCHEMBL8425116 0.82
Silicate SCHEMBL11227548 0.82
Silicate SCHEMBL6264763 0.82
Silicate SCHEMBL23282464 0.76
Silicate SCHEMBL21111528 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1778413-B1 PROCESS FOR COATING METALLIC SURFACES WITH AN ANTI-CORROSIVE COATING CHEMETALL GMBH (DE) 2016-03-16 EP claimed
CN-101137594-B Method of producing a solid mineral material MINEALITHE 2012-10-17 CN claimed
US-20080305341-A1 Process for Coating Metallic Surfaces With an Anti-Corrosive Coating CHEMETALL GMBH (DE) 2008-12-11 US claimed
CN-117835627-A Shell, electronic equipment and shell preparation method 浙江大华技术股份有限公司 2024-04-05 CN disclosed
CN-114950303-A Water rock reaction experimental apparatus 清华大学 2022-08-30 CN disclosed
US-10882752-B2 Method for producing synthetic hectorite at low temperature and atmospheric pressure LG CHEM, LTD. (KR) 2021-01-05 US disclosed
EP-3023369-B1 PROCESS FOR PRODUCTION OF WATER-ABSORBING RESINS NIPPON CATALYTIC CHEM IND (JP) 2019-06-26 EP disclosed
US-20190135645-A1 METHOD FOR PRODUCING SYNTHETIC HECTORITE AT LOW TEMPERATURE AND ATMOSPHERIC PRESSURE LG CHEM, LTD. (KR) 2019-05-09 US disclosed
CN-104203841-B Synergistic silica scale control 陶氏环球技术有限责任公司 2017-04-12 CN disclosed
EP-2263939-B1 METHOD OF FILLING A PARTICULATE WATER-ABSORBING AGENT COMPOSED PRINCIPALLY OF A WATER-ABSORBING RESIN NIPPON CATALYTIC CHEM IND (JP) 2016-07-13 EP disclosed
EP-3023369-A1 PROCESS FOR PRODUCTION OF WATER-ABSORBING RESINS NIPPON SHOKUBAI CO., LTD. (JP) 2016-05-25 EP disclosed
US-20070134871-A1 Memory chip having a memory cell with low-temperature layers in the memory trench and fabrication method TEMMLER DIETMAR 2007-06-14 US disclosed
US-20050090053-A1 Memory chip with low-temperature layers in the trench capacitor INFINEON TECHNOLOGIES AG (DE) 2005-04-28 US disclosed
US-6538295-B1 Salicide device with borderless contact INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-03-25 US disclosed
US-6174762-B1 Salicide device with borderless contact INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-01-16 US disclosed
EP-0377326-B1 Method for the preparation of a transparent metal oxide pigment KEMIRA OY (FI) 1994-08-31 EP disclosed
US-5076849-A Acid-treated slica with base solubility; coating that is base insoluble; extraction KEMIRA OY (FI) 1991-12-31 US disclosed
EP-0406287-A1 A METHOD FOR INCINERATION OF REFUSE FLS MILJO A/S (DK) 1991-01-09 EP disclosed
EP-0377326-A1 Method for the preparation of a transparent metal oxide pigment KEMIRA OY (FI) 1990-07-11 EP disclosed
WO-1989009253-A1 A METHOD FOR INCINERATION OF REFUSE FLS MILJØ A/S (DK) 1989-10-05 WO disclosed