SCHEMBL918554

SCHEMBL918554

CC(c1ccc2cc3ccccc3cc2c1)c1ccc2cc3ccccc3cc2c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
UGT2B7 P16662 1/20 0.59
ADRA2A P08913 3/20 0.50
ADRA2B P18089 3/20 0.50
ADRA2C P18825 3/20 0.50
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
HIF1A Q16665 2/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2D6 P10635 1/20 0.46
TSHR P16473 1/20 0.46
ATM Q13315 1/20 0.46
TDP1 Q9NUW8 2/20 0.44
ALDH1A1 P00352 1/20 0.44
CYP3A4 P08684 1/20 0.44
ALOX15 P16050 1/20 0.44
CASP1 P29466 1/20 0.44
CASP7 P55210 1/20 0.44
HBB P68871 1/20 0.44
HSD17B10 Q99714 1/20 0.44
MMP9 P14780 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3001927 0.86 UGT2B7 (0.61) UGT2B7ADRA2AADRA2BADRA2CCYP2D6
SCHEMBL2491495 0.86 UGT2B7 (0.65) UGT2B7ADRA2AADRA2BADRA2CMEN1
SCHEMBL6885490 0.86 UGT2B7 (0.65) UGT2B7ADRA2AADRA2BADRA2CMEN1
Anthracene SCHEMBL22288151 0.86 UGT2B7 (0.65) UGT2B7ADRA2AADRA2BADRA2CMEN1
SCHEMBL24200914 0.82 UGT2B7 (0.55) UGT2B7ADRA2AADRA2BADRA2CMEN1
SCHEMBL13557418 0.82 UGT2B7 (0.55) UGT2B7ADRA2AADRA2BADRA2CMEN1
SCHEMBL29254013 0.82 UGT2B7 (0.55) UGT2B7MEN1KMT2AHIF1ACYP1A2
SCHEMBL25543458 0.82 UGT2B7 (0.55) UGT2B7MEN1KMT2AHIF1ACYP1A2
SCHEMBL28806243 0.82 UGT2B7 (0.61) UGT2B7ADRA2AADRA2BADRA2CMEN1
SCHEMBL10785006 0.82 UGT2B7 (0.88) UGT2B7MEN1KMT2AHIF1ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7875408-B2 comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure; to improve the aerial image effectively seen by the photoresist and thereby improve the contrast INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-01-25 US disclosed
US-20080182178-A1 Bleachable materials for lithography GLOBALFOUNDRIES U.S. INC. 2008-07-31 US disclosed